Optical system, in particular projection-illumination unit used in microlithography
AssigneeCarl-Zeiss-Stiftung
InventorsErich Merz, Jochen Becker
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Abstract
An optical system, in particular for projection-illumination units used in microlithography, in particular with a slot-shaped field of view or non-rotationally symmetrical illumination, has an optical element 1, in particular a lens or a mirror, which is arranged in a mount 7 or an inner ring 2, and actuators 8a, 8b and 9a, 9b. A plurality of actuators 8a, 8b and 9a, 9b act on the deformable inner ring 2 via a radial force-displacement transmission 12, 13 in order to generate tensile and/or compressive forces.
Claims9
An optical system, in particular a projection-illumination unit used in microlithography, in particular with a slot-shaped filed of view or non-rotationally symmetrical illumination, which has an optical element, in particular a lens or a mirror, which is arranged in a mount or an inner ring, and actuators which act on the optical element and/or the inner ring, wherein a plurality of actuators act on the deformable inner ring via a radial force-displacement transmission to generate a force parallel to the optical axis on the inner ring.
Dependencies are inferred from the claim text.