Information processing apparatus, inspection method, storage medium, exposure apparatus, determination method, and article manufacturing method

An exposure apparatus configured to expose a substrate, the exposure apparatus comprising:

• an information processing apparatus configured to inspect a developed state of the substrate;
• and
• an image capturing unit configured to capture an image of the substrate,
• wherein the information processing apparatus includes an inspection unit configured to obtain a learning model learned using learning data including each image of a plurality of rectangular first areas captured in a state where the plurality of rectangular first areas exposed with each different amount of exposure without a mask on which a pattern is formed is developed and information indicating a first developed state of the plurality of rectangular first areas, and input an image of a second area captured in a state where the second area is developed after exposure to the learning model to acquire inspection data that include information indicating a second developed state of the second area, and
• wherein the each image of the plurality of rectangular first areas, is an image capturing a region including each of four corners of the rectangular first areas,
• wherein the inspection unit performs an acceptable-or-not-acceptable determination for each of the plurality of rectangular first areas, acquires information on exposure amounts corresponding respectively to rectangular first areas determined as acceptable, and determines a smallest exposure amount among the acquired exposure amounts as an exposure amount to be used.

A method for manufacturing an article, the method comprising:

• obtaining a learning model learned using learning data including each image of a plurality of rectangular first areas captured in a state where the plurality of rectangular first areas exposed with each different amount of exposure without a mask on which a pattern is formed is developed and information indicating a first developed state of the plurality of rectangular first areas, and inputting an image of a second area captured in a state where the second area is developed after exposure to the learning model to acquire inspection data that include information indicating a second developed state of the second area;
• determining an exposure amount with which a substrate is to be exposed, based on the acquired inspection data;
• exposing the substrate with the determined exposure amount;
• and
• processing the exposed substrate,
• wherein the article is manufactured from the processed substrate, and
• wherein the each image of the plurality of rectangular first areas, is an image capturing a region including each of four corners of the rectangular first areas,
• performing an acceptable-or-not acceptable determination for each of the plurality of rectangular first areas, acquiring information on exposure amounts corresponding respectively to rectangular first areas determined as acceptable, and determining a smallest exposure amount among the acquired exposure amounts as an exposure amount to be used.