G03F 7/70933
Purge
Official title: {Purge, e.g. exchanging fluid or gas to remove pollutants}
G03F7/70933 (Purge) appears on 452 US grants and 505 published applications in this corpus.
Search patents in G03F- Granted patents
- 452
- Published applications
- 505
- Assignees
- 92
- Inventors
- 1,062
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 6 | 14 |
| 2002 | 16 | 52 |
| 2003 | 30 | 29 |
| 2004 | 42 | 38 |
| 2005 | 32 | 55 |
| 2006 | 54 | 36 |
| 2007 | 20 | 24 |
| 2008 | 19 | 18 |
| 2009 | 13 | 12 |
| 2010 | 16 | 5 |
| 2011 | 7 | 13 |
| 2012 | 8 | 11 |
| 2013 | 3 | 4 |
| 2014 | 12 | 10 |
| 2015 | 13 | 9 |
| 2016 | 11 | 10 |
| 2017 | 9 | 19 |
| 2018 | 17 | 8 |
| 2019 | 16 | 14 |
| 2020 | 14 | 17 |
| 2021 | 14 | 17 |
| 2022 | 14 | 20 |
| 2023 | 14 | 17 |
| 2024 | 9 | 18 |
| 2025 | 17 | 23 |
| 2026 | 9 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Method for depositing a cover layer, EUV lithography system and optical element4 Aug 2026US 12,699,330 B2Carl Zeiss SMT GmbH
- Developing apparatus30 Jun 2026US 12,672,503 B2Tokyo Electron Limited
- Exhaust discharging device with temperature control and heat retention mechanism for preventing photoresist from crystallization and adhering to pipes, and exhaust discharging method using the same2 Jun 2026US 12,645,159 B2Chyi Ding Technologies Co., Ltd.
- Dry chamber clean of photoresist films2 Jun 2026US 12,646,695 B2Lam Research Corporation
- Lithography apparatus and method for operating the same24 Sep 2026US 2026/0288022 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Dry chamber clean of photoresist films10 Sep 2026US 2026/0269199 A1Lam Research Corporation
- Exhaust system3 Sep 2026US 2026/0259511 A1Ebara Corporation
- Measurement device, method of measurement, and method of manufacturing devices6 Aug 2026US 2026/0227709 A1ASML Netherlands B. V.
- Lithographic apparatus, method of increasing plasma concentration, and method of manufacturing devices6 Aug 2026US 2026/0231313 A1ASML Netherlands B. V.
Most cited
By later US patents
- Exposure apparatus, exposure method, and device manufacturing method560US 6,633,364 B2Nikon Corporation · 2003
- Process for laser detection of gas and contaminants in a wafer transport gas tunnel203US 5,953,591 ANippon Sanso Corporation · 1999
- Very narrow band, two chamber, high rep rate gas discharge laser system144US 6,567,450 B2Cymer, Inc. · 2003
- Very narrow band, two chamber, high rep rate gas discharge laser system136US 6,625,191 B2Cymer, Inc. · 2003
- Exposure method, exposure apparatus, and method for manufacturing device121US 7,098,991 B2Nikon Corporation · 2006