G03F 7/70858
Environment aspects
Official title: {Environment aspects, e.g. pressure of beam-path gas, temperature (pollution aspects G03F7/70916)}
G03F7/70858 (Environment aspects) appears on 2,868 US grants and 2,921 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,868
- Published applications
- 2,921
- Assignees
- 336
- Inventors
- 4,282
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 4 | 0 |
| 1981 | 2 | 0 |
| 1982 | 4 | 0 |
| 1983 | 4 | 0 |
| 1984 | 3 | 0 |
| 1985 | 10 | 0 |
| 1986 | 6 | 0 |
| 1987 | 13 | 0 |
| 1988 | 10 | 0 |
| 1989 | 17 | 0 |
| 1990 | 12 | 0 |
| 1991 | 14 | 0 |
| 1992 | 22 | 0 |
| 1993 | 15 | 0 |
| 1994 | 16 | 0 |
| 1995 | 20 | 0 |
| 1996 | 29 | 0 |
| 1997 | 32 | 0 |
| 1998 | 49 | 0 |
| 1999 | 56 | 0 |
| 2000 | 48 | 0 |
| 2001 | 75 | 51 |
| 2002 | 69 | 108 |
| 2003 | 84 | 87 |
| 2004 | 94 | 121 |
| 2005 | 97 | 166 |
| 2006 | 116 | 158 |
| 2007 | 89 | 141 |
| 2008 | 90 | 154 |
| 2009 | 68 | 144 |
| 2010 | 95 | 112 |
| 2011 | 91 | 124 |
| 2012 | 94 | 103 |
| 2013 | 101 | 95 |
| 2014 | 136 | 94 |
| 2015 | 101 | 110 |
| 2016 | 128 | 84 |
| 2017 | 144 | 129 |
| 2018 | 122 | 118 |
| 2019 | 134 | 114 |
| 2020 | 108 | 103 |
| 2021 | 81 | 87 |
| 2022 | 77 | 93 |
| 2023 | 62 | 104 |
| 2024 | 71 | 129 |
| 2025 | 75 | 101 |
| 2026 | 76 | 91 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Cooling system, a semiconductor apparatus including the same, and a method of replacing a filter using the same29 Sep 2026US 12,747,890 B2Samsung Electronics Co., Ltd.
- Prolonging optical element lifetime in an EUV lithography system22 Sep 2026US 12,743,021 B2ASML Netherlands B. V.
- Frequency and amplitude modulation of implant dose for stress management22 Sep 2026US 12,743,030 B2APPLIED Materials.Inc.
- Apparatus for and method of vibration cancellation for laser wavelength and bandwidth stability22 Sep 2026US 12,743,032 B2Cymer, Inc.
- Cooling system, a semiconductor apparatus including the same, and a method of replacing a filter using the same8 Oct 2026US 2026/0309362 A1Samsung Electronics Co., Ltd.
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate holding apparatus, substrate processing apparatus, separation method, and article manufacturing method1 Oct 2026US 2026/0299438 A1Canon Kabushiki Kaisha
- Damper, method for damping, and apparatus including a damper17 Sep 2026US 2026/0276056 A1ASML Netherlands B. V.
- Short-wave systems and methods and suitable targets thereof10 Sep 2026US 2026/0267230 A1L2X-Labs Ltd
Most cited
By later US patents
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Apparatus for the photolithographic manufacture of integrated circuit elements958US 4,509,852 A1985
- Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device918US 5,969,441 AASM Lithography B. V. · 1999