Apparatus for and method of vibration cancellation for laser wavelength and bandwidth stability

An antivibration apparatus for a module for a lithography system, the module having a chassis, the antivibration apparatus comprising:

• a first sensor mechanically coupled to the chassis and arranged to sense a first directional component of a vibration waveform in a first direction and to generate a first output indicative of the first directional component;
• a second sensor mechanically coupled to the chassis and arranged to sense a second directional component of a vibration waveform in a second direction different from the first direction and to generate a second output indicative of the second directional component;
• a cancellation waveform generator arranged to receive the first output and the second output and to generate a first vibration cancellation waveform for the first direction based at least in part on the first output and a second vibration cancellation waveform for the second direction based at least in part on the second output;
• a first actuator mechanically coupled to the chassis and arranged to receive the first vibration cancellation waveform and to generate first cancellation vibrations corresponding to the first vibration cancellation waveform in the first direction;
• and
• a second actuator mechanically coupled to the chassis and arranged to receive the second vibration cancellation waveform and to generate second cancellation vibrations corresponding to the second vibration cancellation waveform in the second direction,
• the antivibration system further comprising a residual vibration cancellation waveform generator
• arranged to receive the first output and the second output,
• adapted to identify a first residual vibration waveform for the first direction based at least in part on the first output while the first cancellation vibration is being generated and generate a first residual vibration suppression waveform based at least in part on the first residual vibration waveform and to add the first residual vibration waveform to the first vibration cancellation waveform, and
• adapted to identify a second residual vibration waveform for the second direction based at least in part on the second output while the second cancellation vibration is being generated and generate a second residual vibration suppression waveform based at least in part on the second residual vibration waveform and to add the second residual vibration waveform to the second vibration cancellation waveform.

An antivibration method for a module for a lithography system, the module having a chassis, the antivibration method comprising:

• sensing a first directional component of a vibration waveform in a first direction and generating a first output indicative of the first directional component;
• sensing a second directional component of a vibration waveform in a second direction different from the first direction and generating a second output indicative of the second directional component;
• generating a first vibration cancellation waveform for the first direction based at least in part on the first output and a second vibration cancellation waveform for the second direction based at least in part on the second output;
• generating first cancellation vibrations in the first direction corresponding to the first vibration cancellation waveform;
• generating second cancellation vibrations in the second direction corresponding to the second vibration cancellation waveform;
• identifying a first residual vibration waveform for the first direction based at least in part on the first output while the first cancellation vibration is being generated and generating a first residual vibration suppression waveform based at least in part on the first residual vibration waveform and adding the first residual vibration waveform to the first vibration cancellation waveform;
• and
• identifying a second residual vibration waveform for the second direction based at least in part on the second output while the second cancellation vibration is being generated and generating a second residual vibration suppression waveform based at least in part on the second residual vibration waveform and adding the second residual vibration waveform to the second vibration cancellation waveform.

An antivibration apparatus for a module for a lithography system, the module having a chassis, the antivibration apparatus comprising:

• a first piezo-mass member mechanically coupled to the chassis to be accelerated in a first direction by a vibration waveform vibrating the chassis and adapted to generate a signal indicative of a component of the vibration waveform in the first direction;
• a controller arranged to receive the signal and adapted to generate a first vibration suppression waveform based at least in part on the signal;
• and
• a second piezo-mass member mechanically coupled to the chassis and arranged to receive the first vibration suppression waveform, the second piezo-mass member being actuated in accordance with the first vibration suppression waveform generated by the controller, regardless of any specific signal transmission path, such that the second piezo-mass member applies a first antivibration force to the chassis in response to the first vibration suppression waveform,
• the controller being adapted to identify a residual vibration component of the signal present while the second piezo-mass member generates the first antivibration force by analyzing a wavelength of the signal in wavelength sigma, and to modify the first vibration suppression waveform to reduce the residual vibration component.