G03F 7/70991
Connection with other apparatus
Official title: {Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum}
G03F7/70991 (Connection with other apparatus) appears on 430 US grants and 522 published applications in this corpus.
Search patents in G03F- Granted patents
- 430
- Published applications
- 522
- Assignees
- 111
- Inventors
- 1,100
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 2 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 4 | 0 |
| 1999 | 6 | 0 |
| 2000 | 7 | 0 |
| 2001 | 17 | 3 |
| 2002 | 12 | 19 |
| 2003 | 9 | 13 |
| 2004 | 19 | 17 |
| 2005 | 24 | 38 |
| 2006 | 19 | 30 |
| 2007 | 20 | 36 |
| 2008 | 10 | 30 |
| 2009 | 14 | 24 |
| 2010 | 28 | 33 |
| 2011 | 10 | 16 |
| 2012 | 19 | 15 |
| 2013 | 17 | 13 |
| 2014 | 14 | 5 |
| 2015 | 15 | 18 |
| 2016 | 14 | 19 |
| 2017 | 11 | 13 |
| 2018 | 14 | 21 |
| 2019 | 22 | 12 |
| 2020 | 18 | 15 |
| 2021 | 19 | 11 |
| 2022 | 10 | 14 |
| 2023 | 9 | 18 |
| 2024 | 16 | 27 |
| 2025 | 9 | 28 |
| 2026 | 10 | 34 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Reticle clamping module22 Sep 2026US 12,743,028 B2Gudeng Equipment Co., Ltd.
- Immersion fluid recovery system and immersion fluid recovery method using said system25 Aug 2026US 12,717,241 B2Zhejiang Cheer Technology Co., Ltd.
- Processing liquid supply apparatus and processing liquid supply method11 Aug 2026US 12,704,793 B2Tokyo Electron Limited
- Coating and developing device7 Jul 2026US 12,675,054 B2ACM Research Korea CO., LTD.
- Developing apparatus30 Jun 2026US 12,672,503 B2Tokyo Electron Limited
- Focus Metrology Method Using Overlay Measurement Tool17 Sep 2026US 2026/0277117 A1KLA Corporation
- Adaptive optical module for a microlithographic projection exposure apparatus10 Sep 2026US 2026/0267133 A1
- Exhaust system3 Sep 2026US 2026/0259511 A1Ebara Corporation
- Orientable semiconductor container and orientation system for semiconductor container3 Sep 2026US 2026/0259513 A1Gudeng Precision Industrial Co., Ltd.
- Superconductive magnet assembly, planar motor and lithographic apparatus3 Sep 2026US 2026/0261191 A1ASML Netherlands B. V.
Most cited
By later US patents
- Precision motion stage with single guide beam and follower stage461US 5,623,853 ANikon Precision Inc. · 1997
- EUV photopatterning of vapor-deposited metal oxide-containing hardmasks405US 9,996,004 B2Lam Research Corporation · 2018
- Process for laser detection of gas and contaminants in a wafer transport gas tunnel203US 5,953,591 ANippon Sanso Corporation · 1999
- Semiconductor production system202US 6,591,207 B2Hitachi, Ltd. · 2003
- Semiconductor production system201US 6,850,854 B2Hitachi, Ltd. · 2005