G03F 7/70808
Construction details
Official title: {Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus}
G03F7/70808 (Construction details) appears on 1,541 US grants and 1,739 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,541
- Published applications
- 1,739
- Assignees
- 249
- Inventors
- 2,755
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 10 | 0 |
| 1989 | 8 | 0 |
| 1990 | 3 | 0 |
| 1991 | 4 | 0 |
| 1992 | 10 | 0 |
| 1993 | 4 | 0 |
| 1994 | 8 | 0 |
| 1995 | 10 | 0 |
| 1996 | 14 | 0 |
| 1997 | 5 | 0 |
| 1998 | 19 | 0 |
| 1999 | 22 | 0 |
| 2000 | 25 | 0 |
| 2001 | 42 | 19 |
| 2002 | 43 | 59 |
| 2003 | 44 | 66 |
| 2004 | 49 | 77 |
| 2005 | 60 | 106 |
| 2006 | 82 | 114 |
| 2007 | 67 | 73 |
| 2008 | 57 | 97 |
| 2009 | 46 | 99 |
| 2010 | 58 | 79 |
| 2011 | 53 | 78 |
| 2012 | 54 | 62 |
| 2013 | 58 | 44 |
| 2014 | 69 | 47 |
| 2015 | 57 | 64 |
| 2016 | 61 | 52 |
| 2017 | 65 | 47 |
| 2018 | 61 | 60 |
| 2019 | 66 | 76 |
| 2020 | 58 | 50 |
| 2021 | 54 | 62 |
| 2022 | 45 | 41 |
| 2023 | 27 | 62 |
| 2024 | 29 | 62 |
| 2025 | 42 | 77 |
| 2026 | 39 | 66 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Storage and transfer module and substrate treatment apparatus including storage and transfer module29 Sep 2026US 12,748,355 B2Semes Co., Ltd.
- Digital photolithography system, components thereof and related methods22 Sep 2026US 12,743,029 B2APPLIED Materials.Inc.
- Light source apparatus, lithography apparatus, and article manufacturing method25 Aug 2026US 12,717,240 B2Canon Kabushiki Kaisha
- Mask inspection apparatus18 Aug 2026US 12,710,701 B2Stek Co., Ltd.
- Combined dispensing and stamping apparatus and method for applying adhesive fluid during a bonding process4 Aug 2026US 12,699,316 B2Asmpt Singapore Pte. Ltd.
- Exposure apparatus and wiring pattern forming method8 Oct 2026US 2026/0310090 A1Nikon Corporation
- Precise, High Throughput Optical Imaging Of Packaged Devices8 Oct 2026US 2026/0310105 A1
- Protective device for a vacuum seal1 Oct 2026US 2026/0299441 A1ASML Netherlands B. V.
- Stage apparatus, substrate processing apparatus, article manufacturing method, and control method of stage apparatus24 Sep 2026US 2026/0288020 A1Canon Kabushiki Kaisha
- Actuator, stage apparatus, lithography apparatus and article manufacturing method17 Sep 2026US 2026/0277122 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Method for optical inspection and lithography624US 5,900,354 A1999
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transportable containers604US 5,388,945 AInternational Business Machines Corporation · 1995
- Lithography system employing a solid immersion lens588US 5,121,256 AThe Board of Trustees of the Leland Stanford Junior University · 1992