G03F 7/70825
Mounting of individual elements
Official title: {Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707)}
G03F7/70825 (Mounting of individual elements) appears on 692 US grants and 834 published applications in this corpus.
Search patents in G03F- Granted patents
- 692
- Published applications
- 834
- Assignees
- 107
- Inventors
- 1,315
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 3 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 7 | 0 |
| 2000 | 11 | 0 |
| 2001 | 23 | 11 |
| 2002 | 14 | 23 |
| 2003 | 16 | 21 |
| 2004 | 18 | 39 |
| 2005 | 21 | 42 |
| 2006 | 38 | 45 |
| 2007 | 34 | 39 |
| 2008 | 28 | 48 |
| 2009 | 24 | 54 |
| 2010 | 34 | 39 |
| 2011 | 26 | 41 |
| 2012 | 24 | 24 |
| 2013 | 28 | 23 |
| 2014 | 25 | 28 |
| 2015 | 28 | 34 |
| 2016 | 33 | 29 |
| 2017 | 29 | 20 |
| 2018 | 34 | 28 |
| 2019 | 33 | 42 |
| 2020 | 31 | 27 |
| 2021 | 30 | 29 |
| 2022 | 24 | 20 |
| 2023 | 12 | 27 |
| 2024 | 11 | 20 |
| 2025 | 16 | 38 |
| 2026 | 16 | 43 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mask inspection apparatus18 Aug 2026US 12,710,701 B2Stek Co., Ltd.
- Combined dispensing and stamping apparatus and method for applying adhesive fluid during a bonding process4 Aug 2026US 12,699,316 B2Asmpt Singapore Pte. Ltd.
- EUV multi-mirror arrangement30 Jun 2026US 12,669,753 B2Carl Zeiss SMT GmbH
- Mask inspection apparatus with a platform module30 Jun 2026US 12,669,757 B2
- Electric component box and extreme ultraviolet light generation apparatus16 Jun 2026US 12,656,695 B2Gigaphoton Inc.
- Exposure apparatus and wiring pattern forming method8 Oct 2026US 2026/0310090 A1Nikon Corporation
- Precise, High Throughput Optical Imaging Of Packaged Devices8 Oct 2026US 2026/0310105 A1
- Adaptive optical module for a microlithographic projection exposure apparatus10 Sep 2026US 2026/0267133 A1
- Optical system for guiding illumination and imaging light from a light source to an image field3 Sep 2026US 2026/0259358 A1
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
Most cited
By later US patents
- Lithography system employing a solid immersion lens588US 5,121,256 AThe Board of Trustees of the Leland Stanford Junior University · 1992
- Window frame-guided stage mechanism438US 5,874,820 ANikon Corporation · 1999
- Exposure apparatus having dynamically isolated reaction frame110US 6,008,500 ANikon Corporation · 1999
- Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame104US 6,020,710 ANikon Corporation · 2000
- Exposure apparatus having dynamically isolated reaction frame103US 6,150,787 ANikon Corporation · 2000