G03F 7/70841
Constructional issues related to vacuum environment
Official title: {Constructional issues related to vacuum environment, e.g. load-lock chamber}
G03F7/70841 (Constructional issues related to vacuum environment) appears on 218 US grants and 247 published applications in this corpus.
Search patents in G03F- Granted patents
- 218
- Published applications
- 247
- Assignees
- 63
- Inventors
- 613
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 4 | 0 |
| 2001 | 6 | 2 |
| 2002 | 5 | 11 |
| 2003 | 9 | 8 |
| 2004 | 10 | 14 |
| 2005 | 10 | 25 |
| 2006 | 13 | 14 |
| 2007 | 13 | 7 |
| 2008 | 4 | 10 |
| 2009 | 4 | 15 |
| 2010 | 12 | 9 |
| 2011 | 5 | 9 |
| 2012 | 8 | 7 |
| 2013 | 5 | 6 |
| 2014 | 6 | 3 |
| 2015 | 6 | 7 |
| 2016 | 6 | 4 |
| 2017 | 3 | 6 |
| 2018 | 6 | 4 |
| 2019 | 9 | 10 |
| 2020 | 9 | 8 |
| 2021 | 5 | 8 |
| 2022 | 9 | 10 |
| 2023 | 6 | 14 |
| 2024 | 8 | 7 |
| 2025 | 8 | 15 |
| 2026 | 4 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Module vessel with scrubber gutters sized to prevent overflow16 Jun 2026US 12,656,697 B2Taiwan Semiconductor Manufacturing Company.Ltd
- EUV light generation apparatus and electronic device manufacturing method17 Mar 2026US 12,578,656 B2Gigaphoton Inc.
- Actuator device for use in a positioning system as well as such positioning system10 Mar 2026US 12,573,933 B2Vdl Enabling Technologies Group B.V.
- Protective ring structure for vacuum interface and method of using the same13 Jan 2026US 12,523,937 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method and apparatus for positioning optical isolator assembly with replaceable motor assembly14 Oct 2025US 12,444,643 B2KLA Corporation
- Protective device for a vacuum seal1 Oct 2026US 2026/0299441 A1ASML Netherlands B. V.
- Stage apparatus, substrate processing apparatus, article manufacturing method, and control method of stage apparatus24 Sep 2026US 2026/0288020 A1Canon Kabushiki Kaisha
- Vacuum load ports, vacuum-compatible doors, and methods for transferring a reticle pod10 Sep 2026US 2026/0267239 A1Entegris, Inc.
- Microlithographic projection exposure system13 Aug 2026US 2026/0235968 A1
- A pod for a patterning device16 Jul 2026US 2026/0202737 A1ASML Netherlands B. V.
Most cited
By later US patents
- Gas bearings for use with vacuum chambers and their application in lithographic projection apparatuses483US 6,603,130 B1ASML Netherlands B. V. · 2003
- Extreme ultraviolet lithography machine73US 6,031,598 AEuv LLC · 2000
- Extreme-UV lithography vacuum chamber zone seal59US 6,333,775 B1Euv LLC · 2001
- Precision stage52US 6,355,994 B1Motorola, Inc. · 2002
- Vibration isolation apparatus for stage51US 6,327,024 B1Nikon Corporation · 2001