EUV light generation apparatus and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• generating EUV light using an EUV light generation apparatus;
• outputting the EUV light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the EUV light in the exposure apparatus to manufacture an electronic device,
• the EUV light generation apparatus including:
• a chamber having internal pressure maintained below atmospheric pressure and being capable of generating the EUV light by irradiating a target in droplet form with laser light inside the chamber;
• a first bellows pipe having one end thereof connected to the chamber to communicate with inside of the chamber;
• a first cover member which seals the other end of the first bellows pipe under atmospheric pressure;
• a holder connected to the first cover member and arranged inside the chamber in a state of holding an optical element on which the EUV light is to be incident;
• a stage mechanism connected to the first cover member outside the chamber and configured to change an angle of the optical element with respect to the EUV light by tilting the first cover member with a rotation center located on a surface of the optical element as a rotation axis;
• a fixing member which fixes the stage mechanism to the chamber;
• and
• a cancellation mechanism which is arranged at a position facing the first cover member via the holder, connected to the holder to be movable in accordance with change of the angle of the optical element, and transmits, to the holder, a second load in a direction opposite to a direction of a first load applied to the first cover member due to pressure difference between atmospheric pressure and pressure inside the chamber.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask with EUV light generated using an EUV light generation apparatus;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the EUV light generation apparatus including:
• a chamber having internal pressure maintained below atmospheric pressure and being capable of generating the EUV light by irradiating a target in droplet form with laser light inside the chamber;
• a first bellows pipe having one end thereof connected to the chamber to communicate with inside of the chamber;
• a first cover member which seals the other end of the first bellows pipe under atmospheric pressure;
• a holder connected to the first cover member and arranged inside the chamber in a state of holding an optical element on which the EUV light is to be incident;
• a stage mechanism connected to the first cover member outside the chamber and configured to change an angle of the optical element with respect to the EUV light by tilting the first cover member with a rotation center located on a surface of the optical element as a rotation axis;
• a fixing member which fixes the stage mechanism to the chamber;
• and
• a cancellation mechanism which is arranged at a position facing the first cover member via the holder, connected to the holder to be movable in accordance with change of the angle of the optical element, and transmits, to the holder, a second load in a direction opposite to a direction of a first load applied to the first cover member due to pressure difference between atmospheric pressure and pressure inside the chamber.