G03F 7/70375
Multiphoton lithography or multiphoton photopolymerization
Official title: {Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation}
G03F7/70375 (Multiphoton lithography or multiphoton photopolymerization) appears on 175 US grants and 131 published applications in this corpus.
Search patents in G03F- Granted patents
- 175
- Published applications
- 131
- Assignees
- 101
- Inventors
- 375
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 1 | 0 |
| 1994 | 5 | 0 |
| 1995 | 2 | 0 |
| 1996 | 8 | 0 |
| 1997 | 11 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 4 | 0 |
| 2001 | 9 | 5 |
| 2002 | 12 | 15 |
| 2003 | 10 | 10 |
| 2004 | 7 | 3 |
| 2005 | 5 | 7 |
| 2006 | 4 | 6 |
| 2007 | 2 | 5 |
| 2008 | 2 | 3 |
| 2009 | 6 | 9 |
| 2010 | 4 | 6 |
| 2011 | 6 | 5 |
| 2012 | 3 | 5 |
| 2013 | 9 | 6 |
| 2014 | 5 | 5 |
| 2015 | 4 | 7 |
| 2016 | 7 | 2 |
| 2017 | 4 | 2 |
| 2018 | 3 | 3 |
| 2019 | 3 | 2 |
| 2020 | 2 | 4 |
| 2021 | 2 | 5 |
| 2022 | 4 | 5 |
| 2023 | 4 | 3 |
| 2024 | 2 | 2 |
| 2025 | 1 | 2 |
| 2026 | 4 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Structure and technique of photo-defined semiconductor device with selective dielectric constant reduction25 Aug 2026US 12,717,995 B2APPLIED Materials.Inc.
- Systems and methods for forming topological lattices of plasmonic merons16 Jun 2026US 12,656,689 B2The Trustees of Columbia University in the City of New York
- Process for creating a three-dimensional structure in a lithography material via a laser lithography device12 May 2026US 12,625,426 B2Nanoscribe Holding GmbH
- Device and method for measuring substrates for semiconductor lithography10 Mar 2026US 12,572,085 B2Carl Zeiss SMT GmbH
- Photoresist formulations 3D microprinting techniques30 Sep 2025US 12,429,766 B2Fondazione Istituto Italiano Di Tecnologia
- Surface plasmon lithography method20 Aug 2026US 2026/0244109 A1Institute of Microelectronics, Chinese Academy of Sciences
- Exposure device and exposure method13 Aug 2026US 2026/0235963 A1Fujikura Ltd.
- Lens manufacturing method and system, and progressive lens28 May 2026US 2026/0147229 A1Nantong Nuotong Yimu Medical Technology Co., Ltd.
- Line scanning temporally focused two-photon lithography system12 Feb 2026US 2026/0044085 A1Massachusetts Institute of Technology
- Analytic method and device for quantitatively calculating line edge roughness in plasma ultra-diffraction photoetching process10 Jul 2025US 2025/0224684 A1Institute of Microelectronics, Chinese Academy of Sciences
Most cited
By later US patents
- Light modulation device and system191US 6,433,917 B1Ball Semiconductor, Inc. · 2002
- Thermal stereolighography154US 5,141,680 A3D Systems, Inc. · 1992
- Methods and apparatus for production of three-dimensional objects by stereolithography122US 4,999,143 A3D Systems, Inc. · 1991
- Thermal stereolithography122US 5,695,707 A3D Systems, Inc. · 1997
- Method of making a three-dimensional object by stereolithography119US 5,182,055 A3D Systems, Inc. · 1993