Process for creating a three-dimensional structure in a lithography material via a laser lithography device

A method for producing a three-dimensional target structure in a lithographic material by means of a laser lithography apparatus, wherein the target structure is defined in that, within a writing region of the laser lithography apparatus, a focus region of a laser writing beam travels through a scanning manifold through the lithographic material, wherein, in the focus region of the laser writing beam, an exposure dose is irradiated into the lithographic material and a structure region is locally defined, the method comprising:

• a) providing at least one exposure data set which represents a local exposure dose for the scan manifold as a function of location;
• b) defining a structure which approximates the target structure on the basis of the at least one exposure data set, wherein the structure is defined utilizing multi-photon absorption, wherein the lithographic material is designed in such a way and the laser writing beam is tuned to the lithographic material in such a way that a change in the lithographic material is only possible by means of the absorption of multiple photons;
• c) analyzing an already defined structure, said already defined structure being defined according to b), by means of a spatially resolving imaging measurement method and determining at least one analysis data set which represents the analyzed structure;
• d) determining a deviation data set, which represents deviations of the already defined structure from the target structure;
• e) determining at least one correction exposure data set which represents a correction exposure dose required for compensating for the deviations for the scan manifold as a function of location;
• and
• f) defining a correction structure based on the at least one correction exposure data set.