Device and method for measuring substrates for semiconductor lithography
AssigneeCarl Zeiss SMT GmbH
InventorsDirk Seidel, Ulrich Matejka
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Abstract
The invention relates to a device for measuring a substrate for semiconductor lithography, comprising an illumination optical unit, an imaging optical unit and a recording device arranged in the image plane of the imaging optical unit, a diffractive element being arranged in the pupil of the imaging optical unit. The invention also relates to a method for measuring a substrate for semiconductor lithography with a measuring device, the measuring device comprising an imaging optical unit with a pupil, with the following method steps: arranging a diffractive element in the pupil of the imaging optical unit for producing a multifocal imaging, capturing the imaging of a partial region of the substrate, and evaluating the imaging.
Claims16
A device for measuring a substrate for semiconductor lithography, comprising an illumination optical unit for illuminating a region of the substrate, an imaging optical unit for imaging the substrate onto an image plane, and a recording device arranged in the image plane of the imaging optical unit,
- wherein a diffractive element is arranged in a pupil of the imaging optical unit and configured to produce multiple images of the illuminated region of the substrate on the recording device with different amounts of defocusing.
Dependencies are inferred from the claim text.