G03F 7/70483
Information management
Official title: {Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring}
G03F7/70483 (Information management) appears on 9,729 US grants and 10,253 published applications in this corpus.
Search patents in G03F- Granted patents
- 9,729
- Published applications
- 10,253
- Assignees
- 1,056
- Inventors
- 12,592
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 4 | 0 |
| 1978 | 2 | 0 |
| 1979 | 3 | 0 |
| 1980 | 5 | 0 |
| 1981 | 2 | 0 |
| 1982 | 6 | 0 |
| 1983 | 10 | 0 |
| 1984 | 8 | 0 |
| 1985 | 9 | 0 |
| 1986 | 16 | 0 |
| 1987 | 19 | 0 |
| 1988 | 26 | 0 |
| 1989 | 26 | 0 |
| 1990 | 32 | 0 |
| 1991 | 36 | 0 |
| 1992 | 32 | 0 |
| 1993 | 27 | 0 |
| 1994 | 61 | 0 |
| 1995 | 64 | 0 |
| 1996 | 57 | 0 |
| 1997 | 96 | 0 |
| 1998 | 146 | 0 |
| 1999 | 162 | 0 |
| 2000 | 155 | 0 |
| 2001 | 168 | 89 |
| 2002 | 225 | 346 |
| 2003 | 267 | 301 |
| 2004 | 317 | 350 |
| 2005 | 265 | 493 |
| 2006 | 335 | 510 |
| 2007 | 338 | 429 |
| 2008 | 329 | 478 |
| 2009 | 361 | 457 |
| 2010 | 358 | 350 |
| 2011 | 306 | 315 |
| 2012 | 279 | 282 |
| 2013 | 281 | 291 |
| 2014 | 314 | 269 |
| 2015 | 315 | 340 |
| 2016 | 310 | 316 |
| 2017 | 352 | 354 |
| 2018 | 380 | 417 |
| 2019 | 485 | 512 |
| 2020 | 507 | 473 |
| 2021 | 426 | 464 |
| 2022 | 377 | 512 |
| 2023 | 378 | 565 |
| 2024 | 364 | 520 |
| 2025 | 403 | 466 |
| 2026 | 280 | 354 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Exposure apparatus and wiring pattern forming method8 Oct 2026US 2026/0310090 A1Nikon Corporation
- Novel design of an inspection tool for an extreme ultraviolet radiation source to observe tin residual8 Oct 2026US 2026/0310098 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for selecting pattern reference features of a substantially irregular pattern layout8 Oct 2026US 2026/0310099 A1ASML Netherlands B. V.
- Methods and apparatuses for obtaining a calibration for a substrate topography measurement and methods and apparatuses for determining a topography of a substrate using the calibration8 Oct 2026US 2026/0310100 A1ASML Netherlands B. V.
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Optical scanner for reading and decoding one- and-two-dimensional symbologies at variable depths of field including memory efficient high speed image processing means and high accuracy image analysis means721US 5,756,981 ASymbol Technologies, Inc. · 1998
- Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool656US 6,201,999 B1APPLIED Materials.Inc. · 2001
- Method for optical inspection and lithography624US 5,900,354 A1999
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001