G03F 7/70491
Information management
Official title: {Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes}
G03F7/70491 (Information management) appears on 2,927 US grants and 3,492 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,927
- Published applications
- 3,492
- Assignees
- 444
- Inventors
- 5,217
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 4 | 0 |
| 1992 | 4 | 0 |
| 1993 | 4 | 0 |
| 1994 | 7 | 0 |
| 1995 | 11 | 0 |
| 1996 | 8 | 0 |
| 1997 | 6 | 0 |
| 1998 | 19 | 0 |
| 1999 | 14 | 0 |
| 2000 | 22 | 0 |
| 2001 | 23 | 14 |
| 2002 | 43 | 57 |
| 2003 | 42 | 66 |
| 2004 | 71 | 92 |
| 2005 | 70 | 134 |
| 2006 | 94 | 133 |
| 2007 | 92 | 132 |
| 2008 | 89 | 155 |
| 2009 | 107 | 150 |
| 2010 | 113 | 126 |
| 2011 | 100 | 121 |
| 2012 | 112 | 123 |
| 2013 | 126 | 90 |
| 2014 | 124 | 83 |
| 2015 | 86 | 88 |
| 2016 | 83 | 88 |
| 2017 | 95 | 100 |
| 2018 | 97 | 157 |
| 2019 | 173 | 176 |
| 2020 | 189 | 190 |
| 2021 | 168 | 194 |
| 2022 | 158 | 213 |
| 2023 | 158 | 229 |
| 2024 | 133 | 223 |
| 2025 | 158 | 191 |
| 2026 | 110 | 167 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/705Modelling or simulating from physical phenomena up to complete wafer processes or1,568
- G03F 7/70525Controlling normal operating mode648
- G03F 7/70508Data handling in all parts of the microlithographic apparatus451
- G03F 7/70516Calibration of components of the microlithographic apparatus420
- G03F 7/70533Controlling abnormal operating mode175
- G03F 7/70541Tagging, i.e. hardware or software tagging of features or components129
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Exposure apparatus and wiring pattern forming method8 Oct 2026US 2026/0310090 A1Nikon Corporation
- Method for selecting pattern reference features of a substantially irregular pattern layout8 Oct 2026US 2026/0310099 A1ASML Netherlands B. V.
- Methods and apparatuses for obtaining a calibration for a substrate topography measurement and methods and apparatuses for determining a topography of a substrate using the calibration8 Oct 2026US 2026/0310100 A1ASML Netherlands B. V.
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Optical scanner for reading and decoding one- and-two-dimensional symbologies at variable depths of field including memory efficient high speed image processing means and high accuracy image analysis means721US 5,756,981 ASymbol Technologies, Inc. · 1998
- Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool656US 6,201,999 B1APPLIED Materials.Inc. · 2001
- Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transportable containers604US 5,388,945 AInternational Business Machines Corporation · 1995
- Exposure apparatus and method of manufacturing device551US 7,884,918 B2Canon Kabushiki Kaisha · 2011
- System for detecting base contaminants in air504US 6,096,267 AExtraction Systems, Inc. · 2000