G03F 7/70533
Controlling abnormal operating mode
Official title: {Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow}
G03F7/70533 (Controlling abnormal operating mode) appears on 175 US grants and 222 published applications in this corpus.
Search patents in G03F- Granted patents
- 175
- Published applications
- 222
- Assignees
- 61
- Inventors
- 514
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 1 | 5 |
| 2003 | 3 | 6 |
| 2004 | 6 | 12 |
| 2005 | 11 | 23 |
| 2006 | 16 | 10 |
| 2007 | 6 | 11 |
| 2008 | 6 | 12 |
| 2009 | 9 | 15 |
| 2010 | 8 | 5 |
| 2011 | 5 | 7 |
| 2012 | 4 | 3 |
| 2013 | 6 | 4 |
| 2014 | 6 | 4 |
| 2015 | 8 | 6 |
| 2016 | 2 | 5 |
| 2017 | 4 | 3 |
| 2018 | 8 | 7 |
| 2019 | 8 | 10 |
| 2020 | 10 | 12 |
| 2021 | 13 | 9 |
| 2022 | 9 | 8 |
| 2023 | 8 | 15 |
| 2024 | 4 | 8 |
| 2025 | 7 | 11 |
| 2026 | 5 | 10 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Systems and methods that use infrared (IR) spectroscopy to monitor process chemicals utilized in a semiconductor process8 Sep 2026US 12,733,457 B2Tokyo Electron Limited
- Optical system, lithography apparatus and method16 Jun 2026US 12,656,693 B2Carl Zeiss SMT GmbH
- Method of diagnosing failure location of control apparatus, diagnostic apparatus, control apparatus, lithography apparatus, article manufacturing method, and non-transitory computer-readable storage medium19 May 2026US 12,631,972 B2Canon Kabushiki Kaisha
- Systems, methods, and devices for thermal conditioning of reticles in lithographic apparatuses17 Mar 2026US 12,578,658 B2ASML Netherlands B. V.
- Determination method, determination apparatus, information processing method, storage medium, information processing apparatus, lithographic apparatus, and method for manufacturing article13 Jan 2026US 12,523,939 B2Canon Kabushiki Kaisha
- Lithography exposure system and lithography method using the same17 Sep 2026US 2026/0277115 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Image positioning control method and system17 Sep 2026US 2026/0277116 A1ASML Netherlands B. V.
- Adaptive optical module for a microlithographic projection exposure apparatus10 Sep 2026US 2026/0267133 A1
- Lithographic apparatus and device manufacturing method23 Jul 2026US 2026/0211341 A1ASML Netherlands B. V.
- Methods and systems for determining reticle deformations16 Jul 2026US 2026/0202766 A1ASML Netherlands B. V.
Most cited
By later US patents
- Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool656US 6,201,999 B1APPLIED Materials.Inc. · 2001
- Design driven inspection or measurement for semiconductor using recipe87US 6,886,153 B1KLA-Tencor Corporation · 2005
- Computer-implemented methods for detecting defects in reticle design data62US 7,646,906 B2KLA-Tencor Technologies Corporation · 2010
- Method and system for processing a semi-conductor device61US 6,841,321 B2Hitachi, Ltd. · 2005
- Method for process optimization and control by comparison between 2 or more measured scatterometry signals37US 7,352,453 B2KLA-Tencor Technologies Corporation · 2008