Design driven inspection or measurement for semiconductor using recipe
AssigneeKLA-Tencor Corporation
InventorChristopher F. Bevis
Life of this patent
Estimating the term…
Abstract
Design driven inspection/metrology methods and apparatus are provided. A recipe is a set of instructions including wafer processing parameters, inspection parameters, or control parameters for telling an inspection/metrology system how to inspect/measure a wafer. Design data is imported into a recipe extraction system that recognizes instances of target structures and configures recipe parameters accordingly, thereby reducing manual instrument setup time, improving inspection/measurement accuracy, and improving fabrication efficiency.
Claims23
For an instrument responsive to recipe parameters, a method for creating a recipe, the method comprising:
- accessing mask set data;
- recognizing a target structure in the mask set data;
- extracting parameters from the mask set data;
- and
- configuring the recipe based on the extracted parameters responsive to the recognized target structure, wherein the configuration of the recipe is performed before a wafer printed with a mask created from the mask set data is generated.
For an instrument instructed by a recipe to perform a task on a wafer, a method comprising:
- receiving design data describing a die;
- extracting parameters from the design data relevant to the configuration of the instrument;
- and
- creating from the extracted parameters, the recipe for performing the task, wherein the recipe is created before a wafer to which the design data has been applied is generated.
A recipe extraction system using design data specifying one or more die, the system comprising:
- an access module to access the design data describing a die;
- an analyzer to extract parameters from the design data;
- and
- a configuration module to produce a recipe for controlling one of an inspection and a metrology instrument, wherein the configuration module produces the recipe before a wafer to which the design data has been applied is generated.
An inspection/metrology instrument using design data specifying one or more die, the instrument comprising:
- an input interface for accessing the design data describing a die;
- an analyzer to recognize target structures in the design data and extract parameters from the design data;
- and
- a recipe module creating a recipe based on the extracted parameters responsive to the recognized target structure, wherein the recipe module creates the recipe before a wafer to which the design data has been applied is generated.
Dependencies are inferred from the claim text.