Computer-implemented methods for detecting defects in reticle design data

A system configured to detect defects in reticle design data, comprising:

• a simulation engine configured to:
• generate a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process;
• and
• generate second simulated images using the first simulated image, wherein the second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process;
• and
• a processor configured to detect defects in the reticle design data using the second simulated images without fabrication of the reticle.

A computer-implemented method for detecting defects in reticle design data, comprising:

• using a computer system to perform steps of:
• generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process;
• generating second simulated images using the first simulated image, wherein the second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process;
• determining a rate of change in a characteristic of the second simulated images as a function of the different values;
• and
• detecting defects in the reticle design data based on the rate of change without fabricating the reticle.

A computer-implemented method for detecting defects in reticle design data printed on a reticle, comprising:

• printing images of the reticle on a wafer at different values of one or more parameters of a wafer printing process;
• using a computer system to perform steps of:
• determining a rate of change in a characteristic of the images as a function of the different values;
• and
• detecting defects in the reticle design data based on the rate of change.