G03F 7/705
Modelling or simulating from physical phenomena up to complete wafer processes or
Official title: {Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions}
G03F7/705 (Modelling or simulating from physical phenomena up to complete wafer processes or) appears on 1,568 US grants and 1,836 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,568
- Published applications
- 1,836
- Assignees
- 256
- Inventors
- 2,793
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 3 | 0 |
| 1996 | 4 | 0 |
| 1997 | 5 | 0 |
| 1998 | 10 | 0 |
| 1999 | 12 | 0 |
| 2000 | 15 | 0 |
| 2001 | 9 | 4 |
| 2002 | 20 | 27 |
| 2003 | 15 | 32 |
| 2004 | 33 | 50 |
| 2005 | 30 | 61 |
| 2006 | 41 | 53 |
| 2007 | 35 | 66 |
| 2008 | 46 | 59 |
| 2009 | 52 | 51 |
| 2010 | 55 | 60 |
| 2011 | 55 | 58 |
| 2012 | 58 | 72 |
| 2013 | 59 | 53 |
| 2014 | 74 | 45 |
| 2015 | 41 | 38 |
| 2016 | 34 | 50 |
| 2017 | 47 | 62 |
| 2018 | 49 | 84 |
| 2019 | 99 | 101 |
| 2020 | 122 | 115 |
| 2021 | 103 | 131 |
| 2022 | 100 | 134 |
| 2023 | 103 | 135 |
| 2024 | 82 | 128 |
| 2025 | 89 | 86 |
| 2026 | 61 | 81 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Method for selecting pattern reference features of a substantially irregular pattern layout8 Oct 2026US 2026/0310099 A1ASML Netherlands B. V.
- Optimization of scanner throughput and imaging quality for a patterning process24 Sep 2026US 2026/0288015 A1ASML Netherlands B. V.
- Recipe transfer of plasma process using plasma parameters determined by virtual metrology (vm) feature selection17 Sep 2026US 2026/0277114 A1Tokyo Electron Limited
- Method and apparatus for determining image structure17 Sep 2026US 2026/0277120 A1Institute of Microelectronics, Chinese Academy of Sciences
Most cited
By later US patents
- Optical scanner for reading and decoding one- and-two-dimensional symbologies at variable depths of field including memory efficient high speed image processing means and high accuracy image analysis means721US 5,756,981 ASymbol Technologies, Inc. · 1998
- System for reading two-dimensional images using ambient and/or projected light473US 6,347,163 B2Symbol Technologies, Inc. · 2002
- Optical scanning head437US 5,354,977 A1994
- Optical scanner for reading and decoding one- and two-dimensional symbologies at variable depths of field429US 5,786,582 ASymbol Technologies, Inc. · 1998
- Phase shifting circuit manufacture method and apparatus356US 5,858,580 ANumerical Technologies, Inc. · 1999