G03F 7/70504
Optical system modelling
Official title: {Optical system modelling, e.g. lens heating models}
G03F7/70504 (Optical system modelling) appears on 18 US grants and 47 published applications in this corpus.
Search patents in G03F- Granted patents
- 18
- Published applications
- 47
- Assignees
- 13
- Inventors
- 121
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 0 | 2 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 1 |
| 2020 | 1 | 0 |
| 2021 | 0 | 0 |
| 2022 | 1 | 3 |
| 2023 | 1 | 9 |
| 2024 | 3 | 6 |
| 2025 | 4 | 10 |
| 2026 | 5 | 14 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Method of configuring extreme ultra-violet (EUV) illumination system, and EUV exposure method using the EUV illumination system8 Sep 2026US 12,730,382 B2Samsung Electronics Co., Ltd.
- Mapping metrics between manufacturing systems4 Aug 2026US 12,699,326 B2ASML Netherlands B. V.
- Overlay improvement method, and method of manufacturing semiconductor device comprising overlay improvement method21 Jul 2026US 12,687,774 B2Samsung Electronics Co., Ltd.
- Method for calibrating a manipulable optical module17 Mar 2026US 12,578,654 B2Carl Zeiss SMT GmbH
- Method and apparatus for determining image structure17 Sep 2026US 2026/0277120 A1Institute of Microelectronics, Chinese Academy of Sciences
- Method for determining an optical property30 Jul 2026US 2026/0219583 A1ASML Netherlands B. V.
- Method of obtaining prediction model, information processing apparatus, article manufacturing method, and non-transitory computer-readable storage medium23 Jul 2026US 2026/0211408 A1Canon Kabushiki Kaisha
- Methods and systems for determining reticle deformations16 Jul 2026US 2026/0202756 A1ASML Netherlands B. V.
- Methods and systems for determining reticle deformation16 Jul 2026US 2026/0202757 A1ASML Netherlands B. V.
Most cited
By later US patents
- Lens heating compensation systems and methods24US 8,570,485 B2ASML Netherlands B. V. · 2013
- Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer program for simulator6US 7,336,341 B2Kabushiki Kaisha Toshiba · 2008
- Multi-component kernels for vector optical image simulation2US 11,435,670 B1Taiwan Semiconductor Manufacturing Company.Ltd · 2022
- Multi-component kernels for vector optical image simulation1US 11,754,930 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2023
- Lens heating compensation systems and methods1US 9,746,784 B2ASML Netherlands B. V. · 2017