Mapping metrics between manufacturing systems
AssigneeASML Netherlands B.V.
InventorsSiebe Tjerk De Zwart, Remco Dirks, Gaurav Nanda, Bastiaan Onne Fagginger Auer
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AssigneeASML Netherlands B.V.
InventorsSiebe Tjerk De Zwart, Remco Dirks, Gaurav Nanda, Bastiaan Onne Fagginger Auer
Estimating the term…
Methods and systems for determining a mapped intensity metric are described. Determining the mapped intensity metric includes determining an intensity metric for a manufacturing system. The intensity metric is determined based on a reflectivity of a location on a substrate and a manufacturing system characteristic. Determining the mapped intensity metric also includes determining a mapped intensity metric for a reference system. The reference system has a reference system characteristic. The mapped intensity metric is determined based on the intensity metric, the manufacturing system characteristic, and the reference system characteristic, to mimic determination of the intensity metric for the manufacturing system using the reference system. In some embodiments, the reference system is virtual, and the manufacturing system is physical.
A non-transitory computer readable medium having instructions thereon or therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
A non-transitory computer readable medium having instructions therein or thereon, the instructions, when executed by a computer system, configured to cause the computer system to at least:
A method for determining a mapped intensity metric, the method comprising:
Dependencies are inferred from the claim text.