Recipe transfer of plasma process using plasma parameters determined by virtual metrology (vm) feature selection

Abstract

A method of process development includes obtaining, from plasma parameters associated with a plasma process, one or more selected plasma parameters by executing a virtual metrology (VM) feature selection process. A coupon recipe is obtained by adjusting a plasma process on a coupon sample based on the selected plasma parameters. The coupon sample includes a wafer coupon positioned on a carrier wafer. The coupon recipe is executed on a first whole wafer. A wafer recipe is obtained based on first values of the selected plasma parameters for the coupon recipe and the coupon sample, second values of the selected plasma parameters for the wafer recipe and the first whole wafer, and control models that describe relationships between the selected plasma parameters and recipe parameters of the plasma process. The wafer recipe is executed on a second whole wafer to determine whether the second whole wafer meets a pre-determined requirement.

Dependencies are inferred from the claim text.