G03F 7/70525
Controlling normal operating mode
Official title: {Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure}
G03F7/70525 (Controlling normal operating mode) appears on 648 US grants and 850 published applications in this corpus.
Search patents in G03F- Granted patents
- 648
- Published applications
- 850
- Assignees
- 133
- Inventors
- 1,715
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 4 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 5 | 5 |
| 2002 | 11 | 13 |
| 2003 | 9 | 20 |
| 2004 | 17 | 11 |
| 2005 | 16 | 25 |
| 2006 | 19 | 24 |
| 2007 | 20 | 36 |
| 2008 | 19 | 42 |
| 2009 | 18 | 35 |
| 2010 | 28 | 30 |
| 2011 | 23 | 31 |
| 2012 | 25 | 22 |
| 2013 | 26 | 15 |
| 2014 | 27 | 18 |
| 2015 | 14 | 18 |
| 2016 | 15 | 14 |
| 2017 | 17 | 14 |
| 2018 | 27 | 42 |
| 2019 | 34 | 27 |
| 2020 | 27 | 44 |
| 2021 | 38 | 53 |
| 2022 | 44 | 53 |
| 2023 | 39 | 68 |
| 2024 | 29 | 59 |
| 2025 | 51 | 71 |
| 2026 | 32 | 60 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Prediction apparatus and method for optical source15 Sep 2026US 12,736,886 B2Cymer, Inc.
- Tool mismatch reduction using aberration map of the tools25 Aug 2026US 12,717,244 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography system and method including thermal management18 Aug 2026US 12,710,703 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Methods and apparatuses for obtaining a calibration for a substrate topography measurement and methods and apparatuses for determining a topography of a substrate using the calibration8 Oct 2026US 2026/0310100 A1ASML Netherlands B. V.
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Information processing apparatus, information processing method, lithographic apparatus, and method of manufacturing article1 Oct 2026US 2026/0299432 A1Canon Kabushiki Kaisha
- Object holder, object table, method of controlling the shape of a surface, method of manufacturing the object holder, and their use in a lithographic method or apparatus1 Oct 2026US 2026/0299440 A1ASML Netherlands B. V.
- Pattern generator and method for driving pattern generator24 Sep 2026US 2026/0288013 A1Mycronic AB
Most cited
By later US patents
- Exposure apparatus and method of manufacturing device551US 7,884,918 B2Canon Kabushiki Kaisha · 2011
- System for detecting base contaminants in air504US 6,096,267 AExtraction Systems, Inc. · 2000
- Method and system for semiconductor wafer fabrication process real-time in-situ interactive supervision424US 6,363,294 B1International Business Machines Corporation · 2002
- Real world modeling and control process187US 4,796,194 A1989
- Lithographic apparatus and device manufacturing method134US 7,352,434 B2ASML Netherlands B. V. · 2008