Lithographic apparatus and device manufacturing method

A device manufacturing method, comprising:

• projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material on a substrate using a projection system;
• providing a liquid on less than an entire surface of the substrate to fill a space between the substrate and the projection system;
• allowing at least part of a system which provides the liquid to move freely in the direction of the optical axis of the projection system and/or rotate about at least one axis perpendicular to the optical axis;
• measuring a height of at least part of the liquid supply system above the surface of the substrate or measuring a surface height of the substrate;
• and
• controlling the height of at least part of the liquid supply system above the surface of the substrate using the measured height.

A lithographic projection apparatus, comprising:

• a substrate table configured to hold a substrate;
• a projection system configured to project a patterned beam onto a target portion of the substrate and having an optical axis;
• a liquid supply system configured to provide an immersion liquid on the substrate, wherein at least part of the liquid supply system is free to move in the direction of the optical axis and/or rotate about at least one axis perpendicular to the optical axis, and wherein the substrate table is configured to move independently of the at least part of the liquid supply system;
• and
• an actuator configured to adjust the height, or the tilt, or both the height and tilt, of the at least part of the liquid supply system with respect to the substrate table.