G03F 7/70508
Data handling in all parts of the microlithographic apparatus
Official title: {Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus}
G03F7/70508 (Data handling in all parts of the microlithographic apparatus) appears on 451 US grants and 638 published applications in this corpus.
Search patents in G03F- Granted patents
- 451
- Published applications
- 638
- Assignees
- 135
- Inventors
- 1,249
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 2 |
| 2002 | 0 | 2 |
| 2003 | 6 | 8 |
| 2004 | 5 | 10 |
| 2005 | 9 | 19 |
| 2006 | 13 | 29 |
| 2007 | 13 | 18 |
| 2008 | 12 | 29 |
| 2009 | 16 | 37 |
| 2010 | 17 | 26 |
| 2011 | 19 | 16 |
| 2012 | 21 | 18 |
| 2013 | 26 | 13 |
| 2014 | 15 | 12 |
| 2015 | 10 | 12 |
| 2016 | 14 | 13 |
| 2017 | 19 | 9 |
| 2018 | 6 | 34 |
| 2019 | 31 | 34 |
| 2020 | 40 | 36 |
| 2021 | 28 | 29 |
| 2022 | 23 | 34 |
| 2023 | 28 | 43 |
| 2024 | 17 | 62 |
| 2025 | 38 | 43 |
| 2026 | 23 | 50 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Exposure apparatus and wiring pattern forming method8 Oct 2026US 2026/0310090 A1Nikon Corporation
- Method for selecting pattern reference features of a substantially irregular pattern layout8 Oct 2026US 2026/0310099 A1ASML Netherlands B. V.
- Method of performing a qualification action on an exposure apparatus24 Sep 2026US 2026/0288014 A1ASML Netherlands B. V.
- Lithography exposure system and lithography method using the same17 Sep 2026US 2026/0277115 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Image positioning control method and system17 Sep 2026US 2026/0277116 A1ASML Netherlands B. V.
Most cited
By later US patents
- Exposure apparatus and method of manufacturing device551US 7,884,918 B2Canon Kabushiki Kaisha · 2011
- Semiconductor production system202US 6,591,207 B2Hitachi, Ltd. · 2003
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- Rasterizer for a pattern generation apparatus131US 5,533,170 AEtec Systems, Inc. · 1996
- Information processing system, information processing method, and computer-readable storage medium78US 8,060,472 B2Canon Kabushiki Kaisha · 2011