Method and apparatus for inspection and metrology
AssigneeASML Netherlands B.V.
InventorsEverhardus Cornelis Mos, Velislava Ignatova, Erik Jensen, Michael Kubis, Hubertus Johannes Gertrudus Simons, Peter Ten Berge, Erik Johannes Maria Wallerbos, Jochem Sebastiaan Wildenberg
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Abstract
A method including evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical models and/or one or more measurement sampling schemes, for which the parameter crosses a threshold.
Claims20
A method comprising:
- determining, by a hardware computer system, a sampling scheme for measuring data and a mathematical model for fitting measured data, to monitor a process step in a lithographic process, wherein the determining of the sampling scheme and mathematical model is at least partially based on a through-put model of an inspection apparatus, the through-put model specifying a number of substrates processed per unit time by the inspection apparatus and/or number of measurements taken per unit of time by the inspection apparatus;
- and
- measuring, by the inspection apparatus, one or more substrates according to the determined sampling scheme to obtain measurement results, and applying the measurement results to the determined mathematical model to fit the measurement results.
A non-transitory computer program product comprising machine-readable instructions that, when executed by a computer system, configured to cause the computer system to at least:
- determine a sampling scheme for measuring data and/or a mathematical model for fitting measured data, to monitor a process step in a lithographic process, wherein the determining of the sampling scheme and/or mathematical model is at least partially
- based on a through-put model of an inspection apparatus, the through-put model specifying a number of substrates processed per unit time by the inspection apparatus and/or number of measurements taken per unit of time by the inspection apparatus;
- and
- measure by the inspection apparatus, one or more substrates according to the determined sampling scheme to obtain measurement results, and apply the measurement results to the determined mathematical model to fit the measurement results.
A method comprising:
- receiving measurement data of a metrology target measured according to a metrology recipe;
- determining, by a hardware computer and at least partially based on a through-put model of an inspection apparatus, a sampling scheme for measuring data with the metrology target using the metrology recipe, the through-put model specifying a number of substrates processed per unit time by the inspection apparatus and/or number of measurements taken per unit of time by the inspection apparatus;
- determining an evaluation parameter based on the measurement data and the sampling scheme;
- determining that the evaluation parameter crosses a threshold;
- changing, at least partially based on the through-put model, the sampling scheme responsive to the evaluation parameter crossing the threshold;
- and
- measuring, by the inspection apparatus, one or more substrates according to the changed sampling scheme.
A non-transitory computer program product comprising machine-readable instructions that, when executed by a computer system, cause the computer system to at least:
- receive measurement data of a metrology target measured according to a metrology recipe;
- determine, at least partially based on a through-put model of an inspection apparatus, a sampling scheme for measuring data with the metrology target using the metrology recipe;
- determine an evaluation parameter based on the measurement data and the sampling scheme;
- determine that the evaluation parameter crosses a threshold;
- change, at least partially based on the through-put model, the sampling scheme responsive to the evaluation parameter crossing the threshold;
- and
- measure, by the inspection apparatus, one or more substrates according to the changed sampling scheme.
Dependencies are inferred from the claim text.