G03F 7/7055
Exposure light control in all parts of the microlithographic apparatus
Official title: {Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption}
G03F7/7055 (Exposure light control in all parts of the microlithographic apparatus) appears on 2,204 US grants and 2,145 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,204
- Published applications
- 2,145
- Assignees
- 393
- Inventors
- 3,365
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 4 | 0 |
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 5 | 0 |
| 1983 | 7 | 0 |
| 1984 | 3 | 0 |
| 1985 | 3 | 0 |
| 1986 | 6 | 0 |
| 1987 | 6 | 0 |
| 1988 | 8 | 0 |
| 1989 | 11 | 0 |
| 1990 | 15 | 0 |
| 1991 | 12 | 0 |
| 1992 | 12 | 0 |
| 1993 | 11 | 0 |
| 1994 | 20 | 0 |
| 1995 | 24 | 0 |
| 1996 | 28 | 0 |
| 1997 | 39 | 0 |
| 1998 | 45 | 0 |
| 1999 | 58 | 0 |
| 2000 | 49 | 0 |
| 2001 | 53 | 32 |
| 2002 | 65 | 132 |
| 2003 | 87 | 76 |
| 2004 | 104 | 95 |
| 2005 | 57 | 140 |
| 2006 | 102 | 144 |
| 2007 | 86 | 113 |
| 2008 | 79 | 132 |
| 2009 | 81 | 128 |
| 2010 | 86 | 81 |
| 2011 | 79 | 82 |
| 2012 | 62 | 54 |
| 2013 | 57 | 66 |
| 2014 | 53 | 59 |
| 2015 | 70 | 66 |
| 2016 | 73 | 51 |
| 2017 | 90 | 63 |
| 2018 | 74 | 84 |
| 2019 | 74 | 65 |
| 2020 | 71 | 59 |
| 2021 | 60 | 78 |
| 2022 | 49 | 73 |
| 2023 | 54 | 86 |
| 2024 | 52 | 75 |
| 2025 | 60 | 67 |
| 2026 | 52 | 44 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Photohardenable compositions and methods of forming an object6 Oct 2026US 12,754,478 B2Quadratic 3D, Inc.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Prediction apparatus and method for optical source15 Sep 2026US 12,736,886 B2Cymer, Inc.
- Method of controlling semiconductor process and semiconductor processing apparatus8 Sep 2026US 12,730,380 B2Samsung Electronics Co., Ltd.
- Edge placement with spatial light modulator writing1 Sep 2026US 12,724,352 B2Mycronic AB
- Lithographic system8 Oct 2026US 2026/0310101 A1ASML Netherlands B. V.
- System for and method of calibrating measurement of duv laser beam spectral properties8 Oct 2026US 2026/0310102 A1Cymer, Inc.
- Digital lithography exposure unit boundary smoothing1 Oct 2026US 2026/0299433 A1APPLIED Materials.Inc.
- Optimization of scanner throughput and imaging quality for a patterning process24 Sep 2026US 2026/0288015 A1ASML Netherlands B. V.
- Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses24 Sep 2026US 2026/0288016 A1ASML Netherlands B. V.
Most cited
By later US patents
- Ultraviolet laser apparatus and exposure apparatus using same250US 7,023,610 B2Nikon Corporation · 2006
- Standard cell design incorporating phase information215US 7,028,285 B2Synopsys, Inc. · 2006
- Phase shift masking for complex patterns with proximity adjustments213US 7,132,203 B2Synopsys, Inc. · 2006
- Design data format and hierarchy management for phase processing201US 6,978,436 B2Synopsys, Inc. · 2005
- Latent-image control of lithography tools176US 5,124,927 AInternational Business Machines Corporation · 1992