G03F 7/70558
Dose control, i.e. achievement of a desired dose
Official title: {Dose control, i.e. achievement of a desired dose}
G03F7/70558 (Dose control, i.e. achievement of a desired dose) appears on 837 US grants and 726 published applications in this corpus.
Search patents in G03F- Granted patents
- 837
- Published applications
- 726
- Assignees
- 207
- Inventors
- 1,637
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 3 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 4 | 0 |
| 1988 | 4 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 4 | 0 |
| 1992 | 6 | 0 |
| 1993 | 5 | 0 |
| 1994 | 9 | 0 |
| 1995 | 3 | 0 |
| 1996 | 11 | 0 |
| 1997 | 19 | 0 |
| 1998 | 26 | 0 |
| 1999 | 38 | 0 |
| 2000 | 32 | 0 |
| 2001 | 31 | 17 |
| 2002 | 36 | 65 |
| 2003 | 42 | 39 |
| 2004 | 53 | 36 |
| 2005 | 24 | 45 |
| 2006 | 34 | 38 |
| 2007 | 19 | 22 |
| 2008 | 26 | 43 |
| 2009 | 29 | 36 |
| 2010 | 32 | 22 |
| 2011 | 25 | 15 |
| 2012 | 13 | 9 |
| 2013 | 15 | 14 |
| 2014 | 9 | 25 |
| 2015 | 13 | 26 |
| 2016 | 31 | 23 |
| 2017 | 22 | 20 |
| 2018 | 26 | 34 |
| 2019 | 33 | 24 |
| 2020 | 24 | 24 |
| 2021 | 30 | 30 |
| 2022 | 13 | 27 |
| 2023 | 15 | 28 |
| 2024 | 18 | 33 |
| 2025 | 26 | 17 |
| 2026 | 20 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of controlling semiconductor process and semiconductor processing apparatus8 Sep 2026US 12,730,380 B2Samsung Electronics Co., Ltd.
- Edge placement with spatial light modulator writing1 Sep 2026US 12,724,352 B2Mycronic AB
- Systems and methods for distributing light delivery28 Jul 2026US 12,693,602 B2ASML Netherlands B. V.
- System, software application, and method for dose uniformity improvement21 Jul 2026US 12,687,788 B2APPLIED Materials.Inc.
- Correction method of multi-beam exposure device21 Jul 2026US 12,687,789 B2Samsung Display Co., Ltd.
- Lithographic system8 Oct 2026US 2026/0310101 A1ASML Netherlands B. V.
- Digital lithography exposure unit boundary smoothing1 Oct 2026US 2026/0299433 A1APPLIED Materials.Inc.
- Optimization of scanner throughput and imaging quality for a patterning process24 Sep 2026US 2026/0288015 A1ASML Netherlands B. V.
- Masking device and controlling method thereof9 Jul 2026US 2026/0194820 A1ASML Netherlands B. V.
- Dose error checking device and method of checking a dose error9 Jul 2026US 2026/0194826 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Standard cell design incorporating phase information215US 7,028,285 B2Synopsys, Inc. · 2006
- Phase shift masking for complex patterns with proximity adjustments213US 7,132,203 B2Synopsys, Inc. · 2006
- Design data format and hierarchy management for phase processing201US 6,978,436 B2Synopsys, Inc. · 2005
- Latent-image control of lithography tools176US 5,124,927 AInternational Business Machines Corporation · 1992
- Reliable modular production quality narrow-band high REP rate excimer laser171US 6,128,323 ACymer, Inc. · 2000