G03F 7/70575
Wavelength control
Official title: {Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength}
G03F7/70575 (Wavelength control) appears on 592 US grants and 553 published applications in this corpus.
Search patents in G03F- Granted patents
- 592
- Published applications
- 553
- Assignees
- 123
- Inventors
- 1,028
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 3 | 0 |
| 1989 | 5 | 0 |
| 1990 | 8 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 5 | 0 |
| 1996 | 8 | 0 |
| 1997 | 7 | 0 |
| 1998 | 12 | 0 |
| 1999 | 16 | 0 |
| 2000 | 17 | 0 |
| 2001 | 14 | 10 |
| 2002 | 24 | 51 |
| 2003 | 33 | 24 |
| 2004 | 32 | 24 |
| 2005 | 14 | 31 |
| 2006 | 29 | 34 |
| 2007 | 24 | 26 |
| 2008 | 19 | 12 |
| 2009 | 15 | 12 |
| 2010 | 21 | 19 |
| 2011 | 6 | 31 |
| 2012 | 19 | 18 |
| 2013 | 14 | 22 |
| 2014 | 17 | 6 |
| 2015 | 16 | 11 |
| 2016 | 9 | 11 |
| 2017 | 18 | 12 |
| 2018 | 17 | 23 |
| 2019 | 16 | 21 |
| 2020 | 20 | 17 |
| 2021 | 17 | 27 |
| 2022 | 16 | 28 |
| 2023 | 20 | 30 |
| 2024 | 21 | 20 |
| 2025 | 21 | 20 |
| 2026 | 18 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photohardenable compositions and methods of forming an object6 Oct 2026US 12,754,478 B2Quadratic 3D, Inc.
- Prediction apparatus and method for optical source15 Sep 2026US 12,736,886 B2Cymer, Inc.
- Lithography apparatus, patterning system, and method of patterning a layered structure4 Aug 2026US 12,699,323 B2APPLIED Materials.Inc.
- Diffraction-based illumination sampling28 Jul 2026US 12,693,155 B2KLA Corporation
- Control voltage threshold selection to facilitate multifocal imaging28 Jul 2026US 12,693,600 B2Cymer, Inc.
- System for and method of calibrating measurement of duv laser beam spectral properties8 Oct 2026US 2026/0310102 A1Cymer, Inc.
- Optical system for guiding illumination and imaging light from a light source to an image field3 Sep 2026US 2026/0259358 A1
- Photohardenable compositions and methods of forming an object3 Sep 2026US 2026/0259492 A1Quadratic 3D, Inc.
- Self-excitation lithography method with self-alignment effect30 Apr 2026US 2026/0118773 A1Institute of Microelectronics, Chinese Academy of Sciences
- Exposure method and electronic device manufacturing method26 Mar 2026US 2026/0086467 A1Gigaphoton Inc.
Most cited
By later US patents
- Ultraviolet laser apparatus and exposure apparatus using same250US 7,023,610 B2Nikon Corporation · 2006
- Reliable modular production quality narrow-band high REP rate excimer laser171US 6,128,323 ACymer, Inc. · 2000
- Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser160US 6,018,537 ACymer, Inc. · 2000
- Wavelength system for an excimer laser146US 5,978,394 ACymer, Inc. · 1999
- Pulse energy control for excimer laser146US 6,005,879 ACymer, Inc. · 1999