G03F 7/70583
Speckle reduction
Official title: {Speckle reduction, e.g. coherence control or amplitude/wavefront splitting}
G03F7/70583 (Speckle reduction) appears on 178 US grants and 105 published applications in this corpus.
Search patents in G03F- Granted patents
- 178
- Published applications
- 105
- Assignees
- 67
- Inventors
- 325
- Latest grant
- 23 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 6 | 0 |
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 4 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 4 | 0 |
| 1991 | 3 | 0 |
| 1992 | 4 | 0 |
| 1993 | 3 | 0 |
| 1994 | 5 | 0 |
| 1995 | 16 | 0 |
| 1996 | 6 | 0 |
| 1997 | 8 | 0 |
| 1998 | 5 | 0 |
| 1999 | 5 | 0 |
| 2000 | 4 | 0 |
| 2001 | 6 | 2 |
| 2002 | 3 | 1 |
| 2003 | 3 | 4 |
| 2004 | 4 | 2 |
| 2005 | 4 | 6 |
| 2006 | 4 | 5 |
| 2007 | 5 | 7 |
| 2008 | 1 | 12 |
| 2009 | 4 | 13 |
| 2010 | 10 | 4 |
| 2011 | 4 | 5 |
| 2012 | 4 | 3 |
| 2013 | 1 | 2 |
| 2014 | 6 | 4 |
| 2015 | 3 | 2 |
| 2016 | 1 | 1 |
| 2017 | 4 | 2 |
| 2018 | 4 | 7 |
| 2019 | 5 | 3 |
| 2020 | 4 | 3 |
| 2021 | 2 | 2 |
| 2022 | 2 | 4 |
| 2023 | 3 | 3 |
| 2024 | 1 | 3 |
| 2025 | 3 | 3 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Optimization of lithographic process based on bandwidth and speckle23 Jun 2026US 12,663,726 B2ASML Netherlands B. V.
- Optical delay system16 Jun 2026US 12,656,620 B2Nikon Corporation
- Lighting optical system and exposure apparatus25 Nov 2025US 12,481,220 B2Ushio Denki Kabushiki Kaisha
- Optical system, in particular for microlithography, and method for operating an optical system16 Sep 2025US 12,416,865 B2Carl Zeiss SMT GmbH
- Apparatus for and method of optical component alignment4 Mar 2025US 12,244,116 B2Cymer, Inc.
- Pitch splitting for euv imaging29 Jan 2026US 2026/0029717 A1Tokyo Electron Limited
- Optical system, in particular for microlithography, and method for operating an optical system1 Jan 2026US 2026/0003294 A1Carl Zeiss SMT GmbH
- A lithographic apparatus, an inspection system, and a detector having a square-core fiber14 Aug 2025US 2025/0258439 A1ASML Netherlands B. V.
- Laser device and electronic device manufacturing method17 Jul 2025US 2025/0233382 A1Gigaphoton Inc.
- Optical pulse stretcher apparatus26 Jun 2025US 2025/0208404 A1Cymer, Inc.
Most cited
By later US patents
- Illumination optical arrangement174US 4,619,508 ANippon Kogaku K. K. · 1986
- Exposure control device170US 4,970,546 ANikon Corporation · 1990
- Laser beam homogenizer161US 4,744,615 AInternational Business Machines Corporation · 1988
- Illumination device including amplitude-division and beam movements157US 5,153,773 ACanon Kabushiki Kaisha · 1992
- Apparatus and method for projecting laser pattern with reduced speckle noise155US 5,621,529 AIntelligent Automation Systems, Inc. · 1997