G03F 7/70591
Testing optical components
Official title: {Testing optical components}
G03F7/70591 (Testing optical components) appears on 1,042 US grants and 1,018 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,042
- Published applications
- 1,018
- Assignees
- 169
- Inventors
- 1,638
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 3 | 0 |
| 1987 | 5 | 0 |
| 1988 | 6 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 7 | 0 |
| 1993 | 2 | 0 |
| 1994 | 11 | 0 |
| 1995 | 10 | 0 |
| 1996 | 5 | 0 |
| 1997 | 15 | 0 |
| 1998 | 29 | 0 |
| 1999 | 34 | 0 |
| 2000 | 27 | 0 |
| 2001 | 30 | 14 |
| 2002 | 29 | 51 |
| 2003 | 45 | 56 |
| 2004 | 50 | 68 |
| 2005 | 40 | 78 |
| 2006 | 53 | 97 |
| 2007 | 64 | 53 |
| 2008 | 55 | 58 |
| 2009 | 54 | 57 |
| 2010 | 45 | 46 |
| 2011 | 29 | 16 |
| 2012 | 22 | 23 |
| 2013 | 28 | 26 |
| 2014 | 28 | 25 |
| 2015 | 24 | 24 |
| 2016 | 27 | 27 |
| 2017 | 34 | 36 |
| 2018 | 35 | 33 |
| 2019 | 36 | 42 |
| 2020 | 37 | 37 |
| 2021 | 29 | 22 |
| 2022 | 16 | 30 |
| 2023 | 21 | 22 |
| 2024 | 14 | 25 |
| 2025 | 22 | 26 |
| 2026 | 12 | 26 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Tool mismatch reduction using aberration map of the tools25 Aug 2026US 12,717,244 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Measurement apparatus, measurement method, lithography apparatus and article manufacturing method18 Aug 2026US 12,710,263 B2Canon Kabushiki Kaisha
- Overlay improvement method, and method of manufacturing semiconductor device comprising overlay improvement method21 Jul 2026US 12,687,774 B2Samsung Electronics Co., Ltd.
- Optical system, test device, lithography apparatus, arrangement and method21 Jul 2026US 12,687,792 B2Carl Zeiss SMT GmbH
- Imaging optical unit30 Jun 2026US 12,669,755 B2Carl Zeiss SMT GmbH
- Method and system for temperature controlling in lithography process10 Sep 2026US 2026/0267240 A1Taiwan Semiconductor Manufacturing Company.Ltd
- A photolithography method and system20 Aug 2026US 2026/0244108 A1Istanbul Medipol Universitesi
- Controlled Environment Photoresist Processing System and Method20 Aug 2026US 2026/0244113 A1
- Exposure apparatus, exposure method, and method for manufacturing article6 Aug 2026US 2026/0227711 A1Canon Kabushiki Kaisha
- Method for producing an optical system for a lithography apparatus, substrate for an optical component of a lithography apparatus, and lithography apparatus30 Jul 2026US 2026/0216920 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Method for optical inspection and lithography624US 5,900,354 A1999
- Latent-image control of lithography tools176US 5,124,927 AInternational Business Machines Corporation · 1992
- Focus and overlay characterization and optimization for photolithographic exposure160US 4,929,083 AXerox Corporation · 1990
- Optical focus phase shift test pattern, monitoring system and process127US 5,300,786 AInternational Business Machines Corporation · 1994
- Apparatus, method of measurement, and method of data analysis for correction of optical system106US 5,828,455 ALitel Instruments · 1998