G03F 7/706
Aberration measurement
Official title: {Aberration measurement}
G03F7/706 (Aberration measurement) appears on 704 US grants and 698 published applications in this corpus.
Search patents in G03F- Granted patents
- 704
- Published applications
- 698
- Assignees
- 121
- Inventors
- 1,069
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 5 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 6 | 0 |
| 1996 | 0 | 0 |
| 1997 | 6 | 0 |
| 1998 | 17 | 0 |
| 1999 | 24 | 0 |
| 2000 | 20 | 0 |
| 2001 | 25 | 7 |
| 2002 | 19 | 43 |
| 2003 | 35 | 42 |
| 2004 | 35 | 44 |
| 2005 | 26 | 54 |
| 2006 | 37 | 68 |
| 2007 | 43 | 43 |
| 2008 | 46 | 42 |
| 2009 | 35 | 46 |
| 2010 | 31 | 29 |
| 2011 | 22 | 11 |
| 2012 | 19 | 20 |
| 2013 | 17 | 16 |
| 2014 | 24 | 17 |
| 2015 | 15 | 19 |
| 2016 | 21 | 17 |
| 2017 | 22 | 23 |
| 2018 | 24 | 21 |
| 2019 | 26 | 25 |
| 2020 | 17 | 25 |
| 2021 | 19 | 14 |
| 2022 | 9 | 13 |
| 2023 | 11 | 13 |
| 2024 | 8 | 17 |
| 2025 | 14 | 10 |
| 2026 | 8 | 19 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Tool mismatch reduction using aberration map of the tools25 Aug 2026US 12,717,244 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Measurement apparatus, measurement method, lithography apparatus and article manufacturing method18 Aug 2026US 12,710,263 B2Canon Kabushiki Kaisha
- Overlay improvement method, and method of manufacturing semiconductor device comprising overlay improvement method21 Jul 2026US 12,687,774 B2Samsung Electronics Co., Ltd.
- Method of managing semiconductor processing apparatus16 Jun 2026US 12,656,692 B2Samsung Electronics Co., Ltd.
- Transmissive diffraction grating2 Jun 2026US 12,645,017 B2ASML Netherlands B. V.
- A photolithography method and system20 Aug 2026US 2026/0244108 A1Istanbul Medipol Universitesi
- Exposure apparatus, exposure method, and method for manufacturing article6 Aug 2026US 2026/0227711 A1Canon Kabushiki Kaisha
- Method for producing an optical system for a lithography apparatus, substrate for an optical component of a lithography apparatus, and lithography apparatus30 Jul 2026US 2026/0216920 A1Carl Zeiss SMT GmbH
- Measuring system for optically checking an alignment state, method for optically checking an alignment state, alignment method30 Jul 2026US 2026/0219036 A1
- Method for determining an optical property30 Jul 2026US 2026/0219583 A1ASML Netherlands B. V.
Most cited
By later US patents
- Latent-image control of lithography tools176US 5,124,927 AInternational Business Machines Corporation · 1992
- Apparatus, method of measurement, and method of data analysis for correction of optical system106US 5,828,455 ALitel Instruments · 1998
- Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations104US 6,650,399 B2ASML Netherlands B. V. · 2003
- Projection exposing apparatus94US 5,424,552 ANikon Corporation · 1995
- Apparatus method of measurement and method of data analysis for correction of optical system93US 5,978,085 ALitel Instruments · 1999