Method of managing semiconductor processing apparatus

A method of managing a semiconductor processing apparatus, the method comprising:

• irradiating, by a light source, a plurality of regions included in a diffuser on a mask stage with extreme ultraviolet (EUV) light;
• reflecting or transmitting, by the diffuser, the EUV light;
• transmitting, by an optical system, the EUV light from the diffuser;
• receiving, by an image sensor, the EUV light from the optical system,
• obtaining, by the image sensor, a plurality of original images corresponding to the plurality of regions;
• generating, based on an optical prediction model to which optical characteristics of the light source, the diffuser, and the plurality of mirrors are applied, a plurality of predictive images estimating a diffraction pattern in the image sensor;
• adjusting an optical prediction model by comparing the plurality of predictive images with the plurality of original images, until consistency between the plurality of predictive images and the plurality of original images is obtained;
• and
• generating, based on the optical prediction model, a plurality of wavefront images corresponding to optical characteristics of each of the plurality of mirrors, based on the consistency between the plurality of predictive images and the plurality of original images being obtained.