G03F 7/70605
Workpiece metrology
Official title: {Workpiece metrology}
G03F7/70605 (Workpiece metrology) appears on 5,447 US grants and 5,783 published applications in this corpus.
Search patents in G03F- Granted patents
- 5,447
- Published applications
- 5,783
- Assignees
- 625
- Inventors
- 7,912
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 4 | 0 |
| 1985 | 7 | 0 |
| 1986 | 6 | 0 |
| 1987 | 8 | 0 |
| 1988 | 15 | 0 |
| 1989 | 11 | 0 |
| 1990 | 12 | 0 |
| 1991 | 19 | 0 |
| 1992 | 16 | 0 |
| 1993 | 13 | 0 |
| 1994 | 29 | 0 |
| 1995 | 24 | 0 |
| 1996 | 27 | 0 |
| 1997 | 48 | 0 |
| 1998 | 79 | 0 |
| 1999 | 86 | 0 |
| 2000 | 66 | 0 |
| 2001 | 74 | 33 |
| 2002 | 107 | 133 |
| 2003 | 125 | 157 |
| 2004 | 141 | 159 |
| 2005 | 152 | 223 |
| 2006 | 143 | 238 |
| 2007 | 157 | 209 |
| 2008 | 159 | 230 |
| 2009 | 191 | 191 |
| 2010 | 188 | 152 |
| 2011 | 160 | 161 |
| 2012 | 125 | 136 |
| 2013 | 125 | 162 |
| 2014 | 168 | 142 |
| 2015 | 170 | 205 |
| 2016 | 160 | 220 |
| 2017 | 200 | 216 |
| 2018 | 241 | 272 |
| 2019 | 328 | 363 |
| 2020 | 353 | 328 |
| 2021 | 302 | 311 |
| 2022 | 256 | 340 |
| 2023 | 257 | 361 |
| 2024 | 248 | 342 |
| 2025 | 263 | 291 |
| 2026 | 177 | 208 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Run to run overlay compensation in lithography sequences employing different lithography methods8 Oct 2026US 2026/0310103 A1
- Repeating noise suppression for array print check inspection8 Oct 2026US 2026/0310104 A1KLA Corporation
- Precise, High Throughput Optical Imaging Of Packaged Devices8 Oct 2026US 2026/0310105 A1
- Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure1 Oct 2026US 2026/0298820 A1ASML Netherlands B. V.
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Method for optical inspection and lithography624US 5,900,354 A1999
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Alumina insulation for coating implantable components and other microminiature devices490US 6,043,437 AAlfred E. Mann Foundation · 2000
- Method of applying insulation for coating implantable components and other microminiature devices464US 6,472,122 B1Medtronic MiniMed, Inc. · 2002