G03F 7/70681
Metrology strategies
Official title: {Metrology strategies}
G03F7/70681 (Metrology strategies) appears on 596 US grants and 740 published applications in this corpus.
Search patents in G03F- Granted patents
- 596
- Published applications
- 740
- Assignees
- 114
- Inventors
- 1,320
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 2 | 2 |
| 2003 | 2 | 3 |
| 2004 | 3 | 12 |
| 2005 | 4 | 9 |
| 2006 | 2 | 7 |
| 2007 | 9 | 13 |
| 2008 | 9 | 10 |
| 2009 | 10 | 7 |
| 2010 | 13 | 9 |
| 2011 | 6 | 15 |
| 2012 | 8 | 12 |
| 2013 | 7 | 17 |
| 2014 | 17 | 14 |
| 2015 | 22 | 35 |
| 2016 | 22 | 42 |
| 2017 | 32 | 38 |
| 2018 | 42 | 49 |
| 2019 | 53 | 53 |
| 2020 | 57 | 41 |
| 2021 | 46 | 54 |
| 2022 | 40 | 56 |
| 2023 | 37 | 78 |
| 2024 | 52 | 66 |
| 2025 | 60 | 58 |
| 2026 | 35 | 39 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Process proximity effect correction method and process proximity effect correction device25 Aug 2026US 12,717,225 B2Samsung Electronics Co., Ltd.
- Inspection method, method for producing composition, and method for verifying composition25 Aug 2026US 12,717,245 B2FUJIFILM Corporation
- One-dimensional overlay marks25 Aug 2026US 12,717,246 B2Intel Corporation
- Overlay mark, overlay error measurement method for wafer, and wafer stacking method18 Aug 2026US 12,710,697 B2Wuhan Xinxin Semiconductor Manufacturing Co., Ltd.
- Methods for measurement of rAIM18 Aug 2026US 12,710,698 B2KLA Corporation
- Configurable illumination source for optical metrology and related methods1 Oct 2026US 2026/0299435 A1Nova Ltd.
- Metrology method and apparatus and computer program background17 Sep 2026US 2026/0276374 A1ASML Netherlands B. V.
- Method and system for creating a stitched design file17 Sep 2026US 2026/0277113 A1APPLIED Materials.Inc.
- Focus Metrology Method Using Overlay Measurement Tool17 Sep 2026US 2026/0277117 A1KLA Corporation
- Overlay metrology based on a fringe pattern17 Sep 2026US 2026/0277118 A1ASML Netherlands B. V.
Most cited
By later US patents
- Spectroscopically measured overlay target118US 7,061,615 B1Nanometrics Incorporated · 2006
- Apparatus and methods for detecting overlay errors using scatterometry96US 7,242,477 B2KLA-Tencor Technologies Corporation · 2007
- Continuously varying offset mark and methods of determining overlay64US 7,440,105 B2KLA-Tencor Technologies Corporation · 2008
- Apparatus and methods for detecting overlay errors using scatterometry52US 7,317,531 B2KLA-Tencor Technologies Corporation · 2008
- Integrated lithographic print and detection model for optical CD50US 6,869,739 B1International Business Machines Corporation · 2005