G03F 7/706831
Recipe selection or optimisation
Official title: {Recipe selection or optimisation, e.g. select or optimise recipe parameters such as wavelength, polarisation or illumination modes}
G03F7/706831 (Recipe selection or optimisation) appears on 35 US grants and 69 published applications in this corpus.
Search patents in G03F- Granted patents
- 35
- Published applications
- 69
- Assignees
- 27
- Inventors
- 213
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2009 | 0 | 1 |
| 2010 | 1 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 1 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 1 |
| 2016 | 0 | 1 |
| 2017 | 1 | 1 |
| 2018 | 1 | 3 |
| 2019 | 2 | 6 |
| 2020 | 5 | 0 |
| 2021 | 4 | 3 |
| 2022 | 0 | 2 |
| 2023 | 1 | 6 |
| 2024 | 3 | 15 |
| 2025 | 9 | 13 |
| 2026 | 6 | 15 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Flexible measurement models for model based measurements of semiconductor structures11 Aug 2026US 12,704,789 B2KLA Corporation
- System and method for determining overlay measurement of a scanning target11 Aug 2026US 12,704,790 B2KLA Corporation
- Time-domain optical metrology and inspection of semiconductor devices14 Jul 2026US 12,680,964 B2Nova Ltd.
- Method of determining a measurement recipe and associated metrology methods and apparatuses2 Jun 2026US 12,645,153 B2ASML Netherlands B. V.
- Extra tall target metrology5 May 2026US 12,619,162 B2KLA Corporation
- Metrology method and apparatus and computer program background17 Sep 2026US 2026/0276374 A1ASML Netherlands B. V.
- Focus Metrology Method Using Overlay Measurement Tool17 Sep 2026US 2026/0277117 A1KLA Corporation
- Alignment method and associated alignment and lithographic apparatuses10 Sep 2026US 2026/0267235 A1ASML Netherlands B. V.
- X-ray focusing and wavelength selection13 Aug 2026US 2026/0237536 A1Nova Measuring Instruments Ltd.
- Design based regi correction (dbrc) - based photomask manufacturing method for controlling pattern position of wafer and mask6 Aug 2026US 2026/0227708 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Scatterometry metrology target design optimization21US 8,214,771 B2KLA-Tencor Corporation · 2012
- Automated process control using an optical metrology system optimized with design goals13US 7,761,178 B2Tokyo Electron Limited · 2010
- Measurement method of overlay mark5US 9,007,571 B2United Microelectronics Corp. · 2015
- Optimizing the utilization of metrology tools3US 10,095,121 B2KLA-Tencor Corporation · 2018
- Performance optimized scanning sequence for eBeam metrology and inspection3US 11,209,737 B1KLA Corporation · 2021