Automated process control using an optical metrology system optimized with design goals

An optical metrology tool for measuring a structure on a workpiece, the optical metrology tool having primary components, the primary components having substantial impact to one or more of a selected plurality of design goals, the optical metrology tool comprising:

• two or more light sources, each light source capable of generating a beam with a set of wavelengths, the two or more light sources generating two or more illumination beams;
• focusing optical components configured to focus the two or more illumination beams to a structure on a workpiece;
• an objective lens assembly configured to direct the two or more illumination beams onto a measurement spot on the structure, each illumination beam reaching the measurement spot at a different angle of incidence, wherein the angle of incidence of the each illumination beam is greater that zero and configured to reflect two or more detection beams off the structure;
• detection beam focusing optical components configured to collect the two or more detection beams off the structure;
• and
• one or more detectors for each of the two or more detection beams;
• wherein design of the optical metrology toot is optimized using a selected plurality of design goals.

A system for controlling a fabrication cluster using an optical metrology system, the optical metrology system optimized using a plurality of design goals, the system comprising:

• an optical metrology system optimized using a plurality of design goals, the optical metrology system configured to measure a structure on the workpiece, the workpiece having profile parameters and configured to determine a profile parameter using a profile extraction methodology;
• a metrology processor configured to transmit at least one profile parameter determined by the optical metrology system;
• and
• a first fabrication cluster having process parameters and equipment settings, the fabrication cluster configured to received the transmitted at least one profile parameter from the metrology processor and adjust at least one process parameter and/or equipment setting of the fabrication cluster based on the at least one profile parameter of the structure.