Performance optimized scanning sequence for eBeam metrology and inspection
AssigneeKLA Corporation
InventorsHenning Stoschus, Stefan Eyring, Ulrich Pohlmann, Inna Steely-Tarshish, Nadav Gutman
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AssigneeKLA Corporation
InventorsHenning Stoschus, Stefan Eyring, Ulrich Pohlmann, Inna Steely-Tarshish, Nadav Gutman
Estimating the term…
A metrology system may include a characterization tool configured to generate metrology data for a sample based on the interaction of an illumination beam with the sample, and may also include one or more adjustable measurement parameters to control the generation of metrology data. The metrology system may include one or more processors that may receive design data associated with a plurality of regions of interest for measurement, select individualized measurement parameters of the characterization tool for the plurality of regions of interest, and direct the characterization tool to characterize the plurality of regions of interest based on the individualized measurement parameters.
A system comprising:
A system comprising:
A method comprising:
Dependencies are inferred from the claim text.