G03F 7/706833
Sampling plan selection or optimisation
Official title: {Sampling plan selection or optimisation, e.g. select or optimise the number, order or locations of measurements taken per die, workpiece, lot or batch}
G03F7/706833 (Sampling plan selection or optimisation) appears on 19 US grants and 37 published applications in this corpus.
Search patents in G03F- Granted patents
- 19
- Published applications
- 37
- Assignees
- 17
- Inventors
- 139
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2012 | 0 | 1 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 1 | 2 |
| 2017 | 0 | 0 |
| 2018 | 1 | 2 |
| 2019 | 1 | 2 |
| 2020 | 2 | 0 |
| 2021 | 1 | 1 |
| 2022 | 1 | 1 |
| 2023 | 2 | 9 |
| 2024 | 4 | 3 |
| 2025 | 3 | 9 |
| 2026 | 3 | 7 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Time-domain optical metrology and inspection of semiconductor devices14 Jul 2026US 12,680,964 B2Nova Ltd.
- Method and system for creating a stiched design file26 May 2026US 12,638,781 B2APPLIED Materials.Inc.
- Active learning-based defect location identification10 Feb 2026US 12,548,141 B2ASML Netherlands B. V.
- Measuring device and measuring method30 Dec 2025US 12,510,830 B2Kioxia Corporation
- Template-based image processing for target segmentation and metrology30 Dec 2025US 12,511,862 B2APPLIED Materials.Inc.
- Configurable illumination source for optical metrology and related methods1 Oct 2026US 2026/0299435 A1Nova Ltd.
- Method for efficient dynamic sampling plan generation and accurate probe die loss projection3 Sep 2026US 2026/0259505 A1ASML Netherlands B. V.
- Full wafer metrology6 Aug 2026US 2026/0228877 A1Nova Ltd.
- Methods of performing 3d metrology on a structure19 Mar 2026US 2026/0079408 A1
- Moving apparatus along multiple axes12 Mar 2026US 2026/0072361 A1
Most cited
By later US patents
- Optimizing the utilization of metrology tools3US 10,095,121 B2KLA-Tencor Corporation · 2018
- Inspection method and apparatus3US 9,360,768 B2ASML Netherlands B. V. · 2016
- Method and apparatus for predicting performance of a metrology system1US 10,884,342 B2ASML Netherlands B. V. · 2021
- Determination of defect location for examination of a specimen1US 11,423,529 B2Applied Materials, Isreal, Ltd. · 2022
- Design-assisted large field of view metrology1US 12,085,385 B2KLA Corporation · 2024