Method and system for creating a stiched design file

A non-transitory computer-readable medium storing instruction that, when executed by a processor, cause a computer system to perform the operations of:

• creating a stitched design file comprising images of a plurality of masks;
• defining a first set of target coordinates for each of the plurality of masks in the stitched design file;
• defining an alignment mark for the stitched design file;
• defining a second set of target coordinates corresponding to the plurality of masks, wherein the second set of target coordinates are utilized for a critical dimension scanning electron microscope (CD-SEM) measurement to locate the second set of target coordinates on an optical device pattern;
• generating a virtual image of the stitched design file by combining the plurality of masks;
• capturing images of the optical device pattern at each of the target coordinates of the first set of target coordinates and the second set of target coordinates, the optical device pattern corresponding to an optical device pattern mask projected onto a large optical device substrate;
• comparing the captured images of the optical device pattern mask at each of the target coordinates to the virtual image of the stitched design file at each of the target coordinates;
• determining whether the optical device pattern at each of the target coordinates meets a threshold value;
• and
• projecting the optical device pattern mask onto the large optical device substrate such that the large optical device substrate is to be printed by a lithography environment device according to the optical device pattern mask.

A method for optical device metrology of optical device patterns, the method comprising:

• creating a stitched design file comprising at least a first mask, a second mask, and a third mask stitched together;
• defining target coordinates for at least each of the first mask, the second mask, and the third mask in the stitched design file;
• defining an alignment mark for the stitched design file;
• generating a virtual image of the stitched design file by combining at least the first mask, the second mask, and the third mask and the alignment mark, wherein the virtual image corresponds to an optical device pattern mask;
• capturing images of the optical device pattern at each of the target coordinates, the optical device pattern corresponding to the optical device pattern mask projected onto a large optical device substrate;
• comparing the captured images of the optical device pattern at each of the target coordinates to the virtual image of the stitched design file at each of the target coordinates;
• determining whether the optical device pattern at each of the target coordinates meets a threshold value;
• and
• projecting the optical device pattern mask onto the large optical device substrate, wherein the optical device pattern mask provides an optical device pattern to be written into a photoresist using an electromagnetic radiation output.