Full wafer metrology

A non-transitory computer readable medium that stores instructions that once executed by an integrated evaluation system causes the integrated evaluation system to:

• introduce, by a motion system of the integrated evaluation system, a relative movement between a sample, and at least one head of an integrated metrology (IM) head of integrated evaluation system or an integrated imaging unit (IIU) head integrated evaluation system;
• perform, by the IM head, measurements of a group of measurement sites of the sample;
• acquire, by the IIU head, images of regions of the sample that comprises the measurement sites;
• wherein an aggregate area of the regions of the samples exceeds an aggregate area of the measurement sites;
• receive, by a processing circuit of integrated evaluation system, the measurements of the group and the images of the regions;
• and
• use a mapping between the measurements and the pixels of the images that correspond to the measurement sites, to estimate measurement values that are within the regions and outside the measurement sites.

A method for operating an integrated evaluation system, the method comprising:

• introducing, by a motion system of the integrated evaluation system, a relative movement between a sample, and at least one head of an integrated metrology (IM) head of the integrated evaluation system or an integrated imaging unit (IIU) head of the integrated evaluation system;
• performing by the IM head, measurements of a group of measurement sites of the sample;
• acquiring, by the IIU head, images of regions of the sample that comprises the measurement sites;
• wherein an aggregate area of the regions of the samples exceeds an aggregate area of the measurement sites;
• receiving, by a processing circuit of the integrated evaluation system, the measurements of the group and the images of the regions;
• and
• using a mapping between the measurements and the pixels of the images that correspond to the measurement sites, to estimate measurement values that are within the regions and outside the measurement sites.