Methods for measurement of rAIM
AssigneeKLA Corporation
InventorYoel Feler
Life of this patent
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AssigneeKLA Corporation
InventorYoel Feler
Estimating the term…
An overlay metrology system may receive an image of an overlay target on a sample in accordance with a metrology recipe, wherein the image is generated by illuminating via oblique illumination an overlay target comprising a plurality of Moiré structures with one or more pairs of illumination beams, wherein portions of the image associated with one or more Moiré structures of the plurality of Moiré structures having periodicity along a measurement direction are formed via Moiré diffraction orders from one of the one or more pairs of the illumination beams having a dipole separation axis orthogonal to the measurement direction, wherein the plurality of Moiré structures include Moiré structures comprising two or more gratings with overlapping regions. The overlay metrology system may determine overlay measurements associated with relative positions of sample layers based on the image of the overlay target.
An overlay metrology system comprising:
An overlay metrology system comprising:
A metrology method comprising:
Dependencies are inferred from the claim text.