G03F 7/706843
Metrology apparatus
Official title: {Metrology apparatus}
G03F7/706843 (Metrology apparatus) appears on 122 US grants and 310 published applications in this corpus.
Search patents in G03F- Granted patents
- 122
- Published applications
- 310
- Assignees
- 53
- Inventors
- 706
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 1 |
| 2013 | 0 | 2 |
| 2014 | 1 | 0 |
| 2015 | 2 | 3 |
| 2016 | 2 | 0 |
| 2017 | 0 | 2 |
| 2018 | 1 | 0 |
| 2019 | 1 | 4 |
| 2020 | 2 | 0 |
| 2021 | 2 | 4 |
| 2022 | 3 | 8 |
| 2023 | 11 | 44 |
| 2024 | 18 | 71 |
| 2025 | 38 | 93 |
| 2026 | 39 | 76 |
By publication year. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Machine learning based metrology for semiconductor specimens6 Oct 2026US 12,754,484 B2Applied Materials Israel Ltd.
- Integrated optical system for scalable and accurate inspection systems6 Oct 2026US 12,754,485 B2ASML Netherlands B. V.
- Intensity measurements using off-axis illumination6 Oct 2026US 12,754,488 B2ASML Netherlands B. V.
- Overlay measurement using balanced capacity targets29 Sep 2026US 12,748,354 B2ASML Netherlands B. V.
- Precise, High Throughput Optical Imaging Of Packaged Devices8 Oct 2026US 2026/0310105 A1
- Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure1 Oct 2026US 2026/0298820 A1ASML Netherlands B. V.
- Apparatus for wavelength-resolved beam monitoring1 Oct 2026US 2026/0299434 A1ASML Netherlands B. V.
- Configurable illumination source for optical metrology and related methods1 Oct 2026US 2026/0299435 A1Nova Ltd.
- Illumination apparatus, measurement apparatus, substrate processing apparatus, and method for manufacturing article1 Oct 2026US 2026/0299436 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Method and apparatus for periodic correction of metrology data23US 6,597,447 B1Advanced Micro Devices, Inc. · 2003
- Photon source, metrology apparatus, lithographic system and device manufacturing method23US 8,921,814 B2ASML Netherlands B. V. · 2014
- Pupil-plane beam scanning for metrology13US 11,300,524 B1KLA Corporation · 2022
- Scanning scatterometry overlay measurement13US 11,428,642 B2KLA Corporation · 2022
- Automated process control using an optical metrology system optimized with design goals13US 7,761,178 B2Tokyo Electron Limited · 2010