G03F 7/706847
Production of measurement radiation
Official title: {Production of measurement radiation, e.g. synchrotron, free-electron laser, plasma source or higher harmonic generation [HHG]}
G03F7/706847 (Production of measurement radiation) appears on 19 US grants and 53 published applications in this corpus.
Search patents in G03F- Granted patents
- 19
- Published applications
- 53
- Assignees
- 18
- Inventors
- 165
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2011 | 0 | 1 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 1 | 0 |
| 2015 | 0 | 1 |
| 2016 | 1 | 0 |
| 2017 | 0 | 1 |
| 2018 | 0 | 0 |
| 2019 | 1 | 1 |
| 2020 | 0 | 0 |
| 2021 | 1 | 0 |
| 2022 | 0 | 2 |
| 2023 | 0 | 2 |
| 2024 | 3 | 13 |
| 2025 | 5 | 15 |
| 2026 | 7 | 16 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Overlay measurement using balanced capacity targets29 Sep 2026US 12,748,354 B2ASML Netherlands B. V.
- Assembly for a laser-operated light source and method of use15 Sep 2026US 12,736,884 B2ASML Netherlands B. V.
- Methods of mitigating crosstalk in metrology images18 Aug 2026US 12,710,699 B2ASML Netherlands B. V.
- Extreme ultraviolet light generation system and electronic device manufacturing method30 Jun 2026US 12,669,756 B2Gigaphoton Inc.
- A multi-pass radiation device20 Aug 2026US 2026/0244006 A1ASML Netherlands B. V.
- Out-Coupling Techniques for Accelerator-based Light Sources in Semiconductor Metrology and Inspection Applications13 Aug 2026US 2026/0235966 A1yTools Inc.
- Lithographic apparatus, method of increasing plasma concentration, and method of manufacturing devices6 Aug 2026US 2026/0231313 A1ASML Netherlands B. V.
- Calibration method and apparatus9 Jul 2026US 2026/0194341 A1ASML Netherlands B. V.
- Euv mask inspecting methods and systems28 May 2026US 2026/0147267 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Photon source, metrology apparatus, lithographic system and device manufacturing method23US 8,921,814 B2ASML Netherlands B. V. · 2014
- Photon source, metrology apparatus, lithographic system and device manufacturing method6US 9,357,626 B2ASML Netherlands B. V. · 2016
- Method and apparatus to determine a patterning process parameter2US 11,143,972 B2ASML Netherlands B. V. · 2021
- Illumination system and metrology system1US 10,416,567 B2ASML Netherlands B. V. · 2019
- Method and apparatus to determine a patterning process parameter1US 11,947,269 B2ASML Netherlands B. V. · 2024