Overlay measurement using balanced capacity targets
AssigneeASML Netherlands B.V.
InventorsHenricus Petrus Maria Pellemans, Benoit Herve Gaury
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Abstract
A method of determining an overlay measurement of a substrate includes: injecting charge into a charge injection element of the substrate; determining a first capacitance of a first pair of elements and a second capacitance of a second pair of elements; and determining a capacitance ratio based on the first capacitance and the second capacitance. The overlay measurement may be determined based on the capacitance ratio, which may indicate an imbalance.
Claims20
A charged particle beam system comprising:
- a charged particle beam source configured to project a charged particle beam on a substrate;
- and
- a controller having circuitry configured to:
- cause the charged particle beam source to inject charge into a charge injection element of the substrate;
- determine a first capacitance of a first pair of elements and a second capacitance of a second pair of elements of the substrate;
- determine a capacitance ratio based on the first capacitance and the second capacitance;
- and
- determine an overlay measurement based on the capacitance ratio.
A non-transitory computer-readable medium storing a set of instructions that are executable by one or more processors of a charged particle beam apparatus to cause the charged particle beam apparatus to perform a method comprising:
- injecting charge into a charge injection element of a substrate;
- determining a first capacitance of a first pair of elements and a second capacitance of a second pair of elements of the substrate;
- determining a capacitance ratio based on the first capacitance and the second capacitance;
- and
- determining an overlay measurement based on the capacitance ratio.
A method of determining an overlay measurement of a substrate, the method comprising:
- injecting charge into a charge injection element of the substrate;
- determining a first capacitance of a first pair of elements and a second capacitance of a second pair of elements;
- determining a capacitance ratio based on the first capacitance and the second capacitance;
- and
- determining the overlay measurement based on the capacitance ratio.
Dependencies are inferred from the claim text.