G03F 7/706851
Detection branch
Official title: {Detection branch, e.g. detector arrangements, polarisation control, wavelength control or dark/bright field detection}
G03F7/706851 (Detection branch) appears on 58 US grants and 139 published applications in this corpus.
Search patents in G03F- Granted patents
- 58
- Published applications
- 139
- Assignees
- 28
- Inventors
- 328
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2015 | 1 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 1 |
| 2018 | 1 | 0 |
| 2019 | 0 | 1 |
| 2020 | 1 | 0 |
| 2021 | 0 | 2 |
| 2022 | 3 | 5 |
| 2023 | 6 | 23 |
| 2024 | 10 | 23 |
| 2025 | 21 | 47 |
| 2026 | 15 | 36 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Integrated optical system for scalable and accurate inspection systems6 Oct 2026US 12,754,485 B2ASML Netherlands B. V.
- Intensity measurements using off-axis illumination6 Oct 2026US 12,754,488 B2ASML Netherlands B. V.
- Quasi-dynamic in situ ellipsometry method and system for measuring photoresist exposure process8 Sep 2026US 12,730,383 B2Huazhong University of Science and Technology
- Off-axis through the lens mutually coherent dark field imaging system with incoherent light for overlay metrology25 Aug 2026US 12,717,248 B2KLA Corporation
- Methods for measurement of rAIM18 Aug 2026US 12,710,698 B2KLA Corporation
- Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure1 Oct 2026US 2026/0298820 A1ASML Netherlands B. V.
- Metrology method and associated metrology and lithographic apparatuses24 Sep 2026US 2026/0288017 A1ASML Netherlands B. V.
- Image preprocessing method for detecting an abnormality24 Sep 2026US 2026/0288018 A1
- Focus Metrology Method Using Overlay Measurement Tool17 Sep 2026US 2026/0277117 A1KLA Corporation
- Overlay metrology based on a fringe pattern17 Sep 2026US 2026/0277118 A1ASML Netherlands B. V.
Most cited
By later US patents
- Pupil-plane beam scanning for metrology13US 11,300,524 B1KLA Corporation · 2022
- Scanning scatterometry overlay measurement13US 11,428,642 B2KLA Corporation · 2022
- Measurement modes for overlay5US 11,346,657 B2KLA Corporation · 2022
- System and method for hyperspectral imaging metrology3US 10,018,560 B2KLA-Tencor Corporation · 2018
- Multi-directional overlay metrology using multiple illumination parameters and isolated imaging3US 11,800,212 B1KLA Corporation · 2023