G03F 7/706845
Calibration
Official title: {Calibration, e.g. tool-to-tool calibration, beam alignment, spot position or focus}
G03F7/706845 (Calibration) appears on 28 US grants and 90 published applications in this corpus.
Search patents in G03F- Granted patents
- 28
- Published applications
- 90
- Assignees
- 21
- Inventors
- 276
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 1 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 2 | 2 |
| 2016 | 1 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 2 |
| 2023 | 2 | 11 |
| 2024 | 3 | 18 |
| 2025 | 7 | 26 |
| 2026 | 12 | 29 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Integrated optical system for scalable and accurate inspection systems6 Oct 2026US 12,754,485 B2ASML Netherlands B. V.
- Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus22 Sep 2026US 12,743,034 B2ASML Netherlands B. V.
- Interchangeable-object holding apparatus and method for an euv metrology system11 Aug 2026US 12,703,100 B2Carl Zeiss SMT GmbH
- Single-cell scatterometry overlay with sensitivity calibration11 Aug 2026US 12,704,787 B2KLA Corporation
- Mapping metrics between manufacturing systems4 Aug 2026US 12,699,326 B2ASML Netherlands B. V.
- Apparatus for wavelength-resolved beam monitoring1 Oct 2026US 2026/0299434 A1ASML Netherlands B. V.
- Metrology method and apparatus and computer program background17 Sep 2026US 2026/0276374 A1ASML Netherlands B. V.
- Focus Metrology Method Using Overlay Measurement Tool17 Sep 2026US 2026/0277117 A1KLA Corporation
- Method for configuring a field of view of an inspection apparatus17 Sep 2026US 2026/0277121 A1ASML Netherlands B. V.
- Alignment method and associated alignment and lithographic apparatuses10 Sep 2026US 2026/0267235 A1ASML Netherlands B. V.
Most cited
By later US patents
- Method and apparatus for periodic correction of metrology data23US 6,597,447 B1Advanced Micro Devices, Inc. · 2003
- Measurement method of overlay mark5US 9,007,571 B2United Microelectronics Corp. · 2015
- Overlay measurement apparatus3US 11,835,865 B2Auros Technology, Inc. · 2023
- Charged particle beam device and overlay misalignment measurement method3US 9,224,575 B2Hitachi High-Technologies Corporation · 2015
- Inspection method and apparatus3US 9,360,768 B2ASML Netherlands B. V. · 2016