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AssigneeASML Netherlands B.V.
InventorsVahid BASTANI, Konstantin Sergeevich NECHAEV, Roy ANUNCIADO, Stefan Cornelis Theodorus VAN DER SANDEN
Estimating the term…
A method for configuring a field of view configuration of an inspection apparatus with respect to a pattern on a patterned substrate to be measured. The method includes: obtaining metrology data including at least one parameter distribution across at least a portion of the pattern, the at least one parameter distribution relating to a respective one or more parameters of interest and/or respective one or more proxy parameters for a parameter of interest; determining variation metric data quantifying an amount of variation captured within the parameter distribution when limited to the field of view for varied field of view configurations; and configuring the field of view configuration with respect to the pattern based on the variation metric data.
A method for configuring a field of view configuration of an inspection apparatus with respect to a pattern on a patterned substrate to be measured, the method comprising:
(canceled)
A non-transient computer program carrier comprising a computer program therein, the computer program, when executed by one or more processors, configured to cause the one or more processors to at least:
Dependencies are inferred from the claim text.