G03F 7/706835
Metrology information management or control
Official title: {Metrology information management or control}
G03F7/706835 (Metrology information management or control) appears on 120 US grants and 341 published applications in this corpus.
Search patents in G03F- Granted patents
- 120
- Published applications
- 341
- Assignees
- 63
- Inventors
- 944
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2003 | 1 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 1 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 1 | 2 |
| 2017 | 0 | 0 |
| 2018 | 2 | 5 |
| 2019 | 2 | 5 |
| 2020 | 5 | 8 |
| 2021 | 4 | 5 |
| 2022 | 7 | 15 |
| 2023 | 7 | 48 |
| 2024 | 21 | 87 |
| 2025 | 28 | 96 |
| 2026 | 39 | 65 |
By publication year. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Machine learning based metrology for semiconductor specimens6 Oct 2026US 12,754,484 B2Applied Materials Israel Ltd.
- Integrated optical system for scalable and accurate inspection systems6 Oct 2026US 12,754,485 B2ASML Netherlands B. V.
- Intensity measurements using off-axis illumination6 Oct 2026US 12,754,488 B2ASML Netherlands B. V.
- Method of performing a qualification action on an exposure apparatus24 Sep 2026US 2026/0288014 A1ASML Netherlands B. V.
- Metrology method and associated metrology and lithographic apparatuses24 Sep 2026US 2026/0288017 A1ASML Netherlands B. V.
- Image preprocessing method for detecting an abnormality24 Sep 2026US 2026/0288018 A1
- Metrology method and apparatus and computer program background17 Sep 2026US 2026/0276374 A1ASML Netherlands B. V.
- Overlay metrology based on a fringe pattern17 Sep 2026US 2026/0277118 A1ASML Netherlands B. V.
Most cited
By later US patents
- Method and apparatus for periodic correction of metrology data23US 6,597,447 B1Advanced Micro Devices, Inc. · 2003
- Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method23US 7,460,237 B1ASML Netherlands B. V. · 2008
- Scatterometry metrology target design optimization21US 8,214,771 B2KLA-Tencor Corporation · 2012
- Methods and apparatus for obtaining diagnostic information relating to an industrial process16US 9,946,165 B2ASML Netherlands B. V. · 2018
- Automated process control using an optical metrology system optimized with design goals13US 7,761,178 B2Tokyo Electron Limited · 2010