G03F 7/706839
Modelling
Official title: {Modelling, e.g. modelling scattering or solving inverse problems}
G03F7/706839 (Modelling) appears on 67 US grants and 207 published applications in this corpus.
Search patents in G03F- Granted patents
- 67
- Published applications
- 207
- Assignees
- 40
- Inventors
- 608
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 1 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 1 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 1 |
| 2019 | 1 | 3 |
| 2020 | 1 | 4 |
| 2021 | 3 | 4 |
| 2022 | 3 | 7 |
| 2023 | 5 | 29 |
| 2024 | 10 | 56 |
| 2025 | 12 | 57 |
| 2026 | 28 | 41 |
By publication year. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Machine learning based metrology for semiconductor specimens6 Oct 2026US 12,754,484 B2Applied Materials Israel Ltd.
- Modular autoencoder model for manufacturing process parameter estimation29 Sep 2026US 12,748,056 B2ASML Netherlands B. V.
- Quasi-dynamic in situ ellipsometry method and system for measuring photoresist exposure process8 Sep 2026US 12,730,383 B2Huazhong University of Science and Technology
- Metrology method and associated metrology and lithographic apparatuses24 Sep 2026US 2026/0288017 A1ASML Netherlands B. V.
- Image preprocessing method for detecting an abnormality24 Sep 2026US 2026/0288018 A1
- Method and apparatus for determining image structure17 Sep 2026US 2026/0277120 A1Institute of Microelectronics, Chinese Academy of Sciences
- Method for configuring a field of view of an inspection apparatus17 Sep 2026US 2026/0277121 A1ASML Netherlands B. V.
- Alignment method and associated alignment and lithographic apparatuses10 Sep 2026US 2026/0267235 A1ASML Netherlands B. V.
Most cited
By later US patents
- Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method23US 7,460,237 B1ASML Netherlands B. V. · 2008
- Scatterometry metrology target design optimization21US 8,214,771 B2KLA-Tencor Corporation · 2012
- Automated process control using an optical metrology system optimized with design goals13US 7,761,178 B2Tokyo Electron Limited · 2010
- Metrology apparatus and method for determining a characteristic of one or more structures on a substrate4US 11,125,806 B2ASML Netherlands B. V. · 2021
- Inspection method and apparatus3US 9,360,768 B2ASML Netherlands B. V. · 2016